⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL109022 | 0.56 | — | — | |
| SCHEMBL9788071 | 0.56 | — | — | |
| SCHEMBL8415499 | 0.56 | — | — | |
| Hydrochloric Acid SCHEMBL3442942 | 0.53 | — | — | |
| SCHEMBL1968597 | 0.53 | — | — | |
| SCHEMBL25289757 | 0.53 | — | — | |
| SCHEMBL3909292 | 0.53 | — | — | |
| Water SCHEMBL639453 | 0.53 | — | — | |
| SCHEMBL2466191 | 0.53 | — | — | |
| Methane SCHEMBL19915300 | 0.53 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106543895-A | Novel antifouling dodges coating and preparation method thereof | 北京国电富通科技发展有限责任公司 | 2017-03-29 | — | — | CN | claimed |
| US-7488693-B2 | Method for producing silicon oxide film | TOAGOSEI CO., LTD. (JP) | 2009-02-10 | — | — | US | claimed |
| EP-0854891-B1 | PROCESS FOR PREPARING COATED PLASTIC SURFACES | DOW GLOBAL TECHNOLOGIES INC (US) | 2003-05-28 | — | — | EP | claimed |
| EP-0641820-B1 | Organosilicon polymer and process for the preparation thereof | TOSHIBA SILICONE (JP) | 1998-08-12 | — | — | EP | claimed |
| US-5489662-A | Process for the preparation of organosilicon polymer | TOSHIBA SILICONE CO., LTD. (JP) | 1996-02-06 | — | — | US | claimed |
| EP-0641820-A1 | Process for the preparation of organosilicon polymer | TOSHIBA SILICONE CO., LTD. (JP) | 1995-03-08 | — | — | EP | claimed |
| CN-117321766-A | Method and application of novel amorphous high-K metal oxide dielectrics by supercritical atomic layer deposition | 应用材料公司 | 2023-12-29 | — | — | CN | disclosed |
| CN-110105383-B | Hydrocarbyloxydisilanes | 美国陶氏有机硅公司 | 2023-04-25 | — | — | CN | disclosed |
| US-20220402943-A1 | HYDROCARBYLOXYDISILANES | DDP SPECIALTY ELECTRONIC MAT US 9 LLC (US) | 2022-12-22 | — | — | US | disclosed |
| WO-2022254751-A1 | RUBBER COMPOSITION AND TIRE | 株式会社ブリヂストン | 2022-12-08 | — | — | WO | disclosed |
| CN-113453791-A | Stabilized filter device | 海纳有限公司 | 2021-09-28 | — | — | CN | disclosed |
| US-11059994-B2 | Silicone resin, related methods, and film formed therewith | DOW SILICONES CORPORATION (US) | 2021-07-13 | — | — | US | disclosed |
| CN-109075229-B | Thermosetting resin composition, substrate for mounting optical semiconductor element, method for producing same, and optical semiconductor device | 昭和电工材料株式会社 | 2021-03-19 | — | — | CN | disclosed |
| EP-1138633-A1 | PROCESS FOR PRODUCING FLUORINATED SILICON COMPOUND | Mitsui Chemicals, Inc. (JP) | 2001-10-04 | — | — | EP | disclosed |
| EP-0669363-B1 | Process for preparing polyorganosilane | TOSHIBA SILICONE (JP) | 1999-08-18 | — | — | EP | disclosed |
| EP-0641820-B1 | Organosilicon polymer and process for the preparation thereof | TOSHIBA SILICONE (JP) | 1998-08-12 | — | — | EP | disclosed |
| US-5633312-A | Process for preparing polyorganosilane | TOSHIBA SILICONE CO., LTD. (JP) | 1997-05-27 | — | — | US | disclosed |
| US-5489662-A | Process for the preparation of organosilicon polymer | TOSHIBA SILICONE CO., LTD. (JP) | 1996-02-06 | — | — | US | disclosed |
| EP-0669363-A2 | Process for preparing polyorganosilane | TOSHIBA SILICONE CO., LTD. (JP) | 1995-08-30 | — | — | EP | disclosed |
| EP-0641820-A1 | Process for the preparation of organosilicon polymer | TOSHIBA SILICONE CO., LTD. (JP) | 1995-03-08 | — | — | EP | disclosed |