⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28549177 | 0.83 | TSHR (0.44) | — | |
| SCHEMBL20496110 | 0.79 | TSHR (0.53) | — | |
| SCHEMBL1138627 | 0.79 | TSHR (0.45) | — | |
| SCHEMBL2011391 | 0.79 | — | — | |
| SCHEMBL561301 | 0.79 | TSHR (0.45) | — | |
| SCHEMBL866028 | 0.79 | — | — | |
| SCHEMBL28278510 | 0.78 | HCAR2 (0.33) | — | |
| SCHEMBL1408579 | 0.77 | — | — | |
| SCHEMBL34386 | 0.77 | — | — | |
| SCHEMBL18215276 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3842414-B1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | SHOWA DENKO KK (JP) | 2023-04-05 | — | — | EP | disclosed |
| EP-3842416-B1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | SHOWA DENKO KK (JP) | 2023-03-01 | — | — | EP | disclosed |
| EP-3842415-A1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | Showa Denko K.K. (JP) | 2021-06-30 | — | — | EP | disclosed |
| EP-3842416-A1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | Showa Denko K.K. (JP) | 2021-06-30 | — | — | EP | disclosed |
| EP-3842414-A1 | COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND | Showa Denko K.K. (JP) | 2021-06-30 | — | — | EP | disclosed |
| EP-3119822-B1 | AMINE CO-ACCELERATOR FOR ACRYLIC ADHESIVES | LORD CORP (US) | 2019-09-25 | — | — | EP | disclosed |
| EP-2602244-B1 | (Meth) Acrylic acid ester, activation energy ray curing composition, and inkjet recording ink | RICOH CO LTD (JP) | 2017-07-26 | — | — | EP | disclosed |
| EP-3119822-A1 | AMINE CO-ACCELERATOR FOR ACRYLIC ADHESIVES | LORD Corporation (US) | 2017-01-25 | — | — | EP | disclosed |
| WO-2015143005-A1 | AMINE CO-ACCELERATOR FOR ACRYLIC ADHESIVES | LORD CORPORATION (US) | 2015-09-24 | — | — | WO | disclosed |
| EP-2602244-A1 | (Meth) Acrylic acid ester, activation energy ray curing composition, and inkjet recording ink | Ricoh Company, Ltd. (JP) | 2013-06-12 | — | — | EP | disclosed |
| CN-102741926-A | Uv curable composition for optical discs and optical disc | DAINIPPON INK & CHEMICALS | 2012-10-17 | — | — | CN | disclosed |
| CN-101589433-A | Ultraviolet-curable composition for optical disk intermediate layer and optical disk | DAINIPPON INK & CHEMICALS (JP) | 2009-11-25 | — | — | CN | disclosed |
| EP-2091994-A1 | POLYMERIZABLE MONOMER COMPOSITION AND METHOD FOR PREVENTING POLYMERIZATION | Showa Denko K.K. (JP) | 2009-08-26 | — | — | EP | disclosed |
| WO-2008069256-A1 | POLYMERIZABLE MONOMER COMPOSITION AND METHOD FOR PREVENTING POLYMERIZATION | SHOWA DENKO K.K. (JP) | 2008-06-12 | — | — | WO | disclosed |
| EP-0220555-A2 | Structural adhesive formulations | LORD CORPORATION (US) | 1987-05-06 | — | — | EP | disclosed |
| US-4322509-A | CONTAINING A CARBOXYLATED ACRYLONITRILE-BUTADIENE COPOLYMER TO INHIBIT PRECIPITATION OF PHOSPHATE | LORD CORPORATION (US) | 1982-03-30 | — | — | US | disclosed |