Ethylene

Ethylene

SCHEMBL4104666

C=C.C=CCOCCCCC

nearest known ligand 0.69

Full drug profile on Sugi Atlas →

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
POLB P06746 1/20 0.48
TSHR P16473 4/20 0.42
HTT P42858 2/20 0.41
THRB P10828 1/20 0.41
MAPT P10636 1/20 0.41
ALDH1A1 P00352 2/20 0.40
CES2 O00748 1/20 0.39
PLA2G2C Q5R387 1/20 0.38
TDP1 Q9NUW8 1/20 0.36
USP2 O75604 1/20 0.36
LSS P48449 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene SCHEMBL28192571 0.98 MEN1 (0.47) MEN1KMT2APOLBTSHRHTT
SCHEMBL89068 0.98
SCHEMBL99221 0.95 MEN1 (0.48) MEN1KMT2APOLBTSHRHTT
Ammonia Solution, Strong SCHEMBL906575 0.95 MEN1 (0.48) MEN1KMT2APOLBTSHRHTT
SCHEMBL1563951 0.95 MEN1 (0.48) MEN1KMT2APOLBTSHRHTT
SCHEMBL475922 0.95 MEN1 (0.48) MEN1KMT2APOLBTSHRHTT
SCHEMBL8581872 0.95 MEN1 (0.48) MEN1KMT2APOLBTSHRHTT
SCHEMBL8482912 0.95 MEN1 (0.48) MEN1KMT2APOLBTSHRHTT
SCHEMBL2340995 0.95 MEN1 (0.48) MEN1KMT2APOLBTSHRHTT
SCHEMBL2187231 0.95 MEN1 (0.48) MEN1KMT2APOLBTSHRHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2930191-B1 Superabsorbent polymer having fast absorption EVONIK CORP (US) 2020-09-16 EP disclosed
EP-3677647-A1 PIGMENT COMPOSITION, PRODUCTION METHOD THEREFOR, AND WATER-BASED INK COMPOSITION FUJIFILM Corporation (JP) 2020-07-08 EP disclosed
US-20200181411-A1 PIGMENT COMPOSITION, METHOD FOR PRODUCING THEREOF, AND AQUEOUS INK COMPOSITION FUJIFILM CORPORATION (JP) 2020-06-11 US disclosed
US-10307732-B2 Particulate superabsorbent polymer composition having improved stability and fast absorption EVONIK CORPORATION (US) 2019-06-04 US disclosed
US-20160060418-A1 PARTICULATE SUPERABSORBENT POLYMER COMPOSITION HAVING IMPROVED STABILITY AND FAST ABSORPTION EVONIK SUPERABSORBER LLC 2016-03-03 US disclosed
EP-2984125-A1 PARTICULATE SUPERABSORBENT POLYMER COMPOSITION HAVING IMPROVED STABILITY AND FAST ABSORPTION Evonik Corporation (US) 2016-02-17 EP disclosed
EP-2930191-A1 Superabsorbent polymer having fast absorption Evonik Corporation (US) 2015-10-14 EP disclosed
US-20150283284-A1 SUPERABSORBENT POLYMER HAVING FAST ABSORPTION EVONIK CORPORATION (US) 2015-10-08 US disclosed
CN-103596934-B Triazene compound and use thereof KUREHA CORP. (JP) 2015-08-19 CN disclosed
CN-104529918-A Triazole compound and use thereof KUREHA CORP 2015-04-22 CN disclosed
EP-1141063-A1 HIGH PHOTO-SENSITIVITY CURABLE RESIN, PHOTO-CURABLE RESIN COMPOSITION, PRODUCTION METHOD THEREOF, COLOR FILTER AND LIQUID CRYSTAL DISPLAY PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2001-10-10 EP disclosed
US-6291636-B1 DRYING HYDROGEL OF A CROSSLINKED POLYMER; PULVERIZING; SEPARATING NIPPON SHOKUBAI CO., LTD. (JP) 2001-09-18 US disclosed
WO-2001027182-A1 HIGH PHOTO-SENSITIVITY CURABLE RESIN, PHOTO-CURABLE RESIN COMPOSITION, PRODUCTION METHOD THEREOF, COLOR FILTER AND LIQUID CRYSTAL DISPLAY PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2001-04-19 WO disclosed
EP-1076070-A2 Highly stable resin, hardenable resin composition, production method therefor, color filter and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2001-02-14 EP disclosed
US-6107358-A DISPERSING BUBBLES OF AN INERT GAS IN AN AQUEOUS MONOMER SOLUTION OF A MIXTURE OF A WATER SOLUBLE UNSATURATED MONOMER AND WATER SOLUBLE CROSS-LINKING MONOMER, COPOLYMERIZING THE MONOMER MIXTURE NIPPON SHOKUBAI CO., LTD. (JP) 2000-08-22 US disclosed
EP-0967874-A1 HERBICIDAL COMPOSITION SUMITOMO CHEMICAL COMPANY LIMITED (JP) 2000-01-05 EP disclosed
EP-0948997-A2 Manufacturing method of absorbent resin Nippon Shokubai Co., Ltd. (JP) 1999-10-13 EP disclosed
WO-1998035559-A1 HERBICIDAL COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1998-08-20 WO disclosed
EP-0827753-A2 Water-absorbent resin and method for production thereof NIPPON SHOKUBAI CO., LTD. (JP) 1998-03-11 EP disclosed
US-4746678-A FUNGICIDES EGIS GYORYSZERGYAR (HU) 1988-05-24 US disclosed