⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11995859 | 0.86 | — | — | |
| SCHEMBL12761991 | 0.74 | — | — | |
| SCHEMBL11995856 | 0.74 | — | — | |
| SCHEMBL11995858 | 0.67 | — | — | |
| SCHEMBL21445359 | 0.65 | — | — | |
| SCHEMBL11995857 | 0.65 | — | — | |
| SCHEMBL15380722 | 0.63 | — | — | |
| SCHEMBL10188302 | 0.60 | — | — | |
| SCHEMBL13883634 | 0.59 | — | — | |
| SCHEMBL16807892 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9778567-B2 | Resist composition, method of forming resist pattern, polymeric compound, compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-03 | — | — | US | disclosed |
| US-20170242339-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-24 | — | — | US | disclosed |
| US-20170131634-A1 | CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-05-11 | — | — | US | disclosed |
| US-20170075224-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-03-16 | — | — | US | disclosed |
| US-20170075221-A1 | CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-03-16 | — | — | US | disclosed |
| US-20160376234-A1 | COLORING CURABLE RESIN COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, IMAGE DISPLAY DEVICE, COMPOUND, AND CATION | FUJIFILM CORPORATION (JP) | 2016-12-29 | — | — | US | disclosed |
| US-20160299432-A1 | NEGATIVE RESIST PATTERN-FORMING METHOD, AND COMPOSITION FOR UPPER LAYER FILM FORMATION | JSR CORPORATION (JP) | 2016-10-13 | — | — | US | disclosed |
| US-9164379-B2 | Resist composition, method for forming resist pattern, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-10-20 | — | — | US | disclosed |
| US-9097969-B2 | Compound, resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-08-04 | — | — | US | disclosed |
| US-9091916-B2 | Positive-type photoresist composition, photoresist laminate, method for producing photoresist pattern, and method for producing connecting terminal | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-07-28 | — | — | US | disclosed |
| US-9017919-B2 | Resist composition, method of forming resist pattern, novel compound and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-8932797-B2 | Photoacid generators | DOW GLOBAL TECHNOLOGIES LLC (US) | 2015-01-13 | — | — | US | disclosed |
| US-8703383-B2 | Photosensitive copolymer and photoresist composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-04-22 | — | — | US | disclosed |
| US-20140017617-A1 | METHOD OF PRODUCING AMMONIUM SALT COMPOUND, METHOD OF PRODUCING COMPOUND, AND COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-01-16 | — | — | US | disclosed |
| US-20130302736-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-14 | — | — | US | disclosed |
| US-8367299-B2 | Resist composition, method of forming resist pattern, compound and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-02-05 | — | — | US | disclosed |
| US-20120141939-A1 | PHOTOACID GENERATORS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2012-06-07 | — | — | US | disclosed |
| US-20120129105-A1 | PHOTOSENSITIVE COPOLYMER AND PHOTORESIST COMPOSITION | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-05-24 | — | — | US | disclosed |
| US-20120107744-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| US-20120009521-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-12 | — | — | US | disclosed |