SCHEMBL412206

SCHEMBL412206

CCCCCCCCO[PH](=O)O

nearest known ligand 0.50

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
LPAR3 Q9UBY5 6/20 0.50
LPAR2 Q9HBW0 5/20 0.50
LPAR1 Q92633 2/20 0.50
NAAA Q02083 1/20 0.45
CES2 O00748 1/20 0.43
EPHX1 P07099 1/20 0.42
MEN1 O00255 1/20 0.41
THRB P10828 1/20 0.41
HTT P42858 1/20 0.41
KMT2A Q03164 1/20 0.41
MAPT P10636 1/20 0.41
TSHR P16473 2/20 0.41
CA1 P00915 4/20 0.40
CA2 P00918 4/20 0.40
CA9 Q16790 4/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1543339 1.00 LPAR3 (0.50) LPAR3LPAR2LPAR1NAAACES2
SCHEMBL7949874 1.00 LPAR3 (0.50) LPAR3LPAR2LPAR1NAAACES2
SCHEMBL3715328 1.00 LPAR3 (0.50) LPAR3LPAR2LPAR1NAAACES2
SCHEMBL657266 1.00 LPAR3 (0.50) LPAR3LPAR2LPAR1NAAACES2
SCHEMBL16583633 1.00 LPAR3 (0.50) LPAR3LPAR2LPAR1NAAACES2
SCHEMBL9183199 1.00 LPAR3 (0.50) LPAR3LPAR2LPAR1NAAACES2
SCHEMBL3625203 1.00 LPAR3 (0.50) LPAR3LPAR2LPAR1NAAACES2
SCHEMBL4708129 1.00 LPAR3 (0.50) LPAR3LPAR2LPAR1NAAACES2
SCHEMBL466159 1.00 LPAR3 (0.50) LPAR3LPAR2LPAR1NAAACES2
SCHEMBL16583681 1.00 LPAR3 (0.50) LPAR3LPAR2LPAR1NAAACES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 227 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112041970-B Aqueous composition and cleaning method using same 三菱瓦斯化学株式会社 2025-02-07 CN claimed
CN-112005345-B Aqueous composition and cleaning method using same 三菱瓦斯化学株式会社 2025-01-28 CN claimed
CN-112005346-B Aqueous composition and cleaning method using same 三菱瓦斯化学株式会社 2025-01-14 CN claimed
EP-3787008-B1 AQUEOUS COMPOSITION AND CLEANING METHOD USING SAME MITSUBISHI GAS CHEMICAL CO (JP) 2024-04-10 EP claimed
EP-3787010-B1 AQUEOUS CLEANING COMPOSITION AND CLEANING METHOD USING SAME MITSUBISHI GAS CHEMICAL CO (JP) 2024-04-10 EP claimed
US-11629315-B2 Aqueous composition and cleaning method using same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-04-18 US claimed
US-11613720-B2 Aqueous composition and cleaning method using same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-03-28 US claimed
CN-115250615-A Welding flux 千住金属工业株式会社 2022-10-28 CN claimed
US-11352593-B2 Aqueous composition and cleaning method using same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-06-07 US claimed
EP-3698913-B1 FLUX AND RESIN COMPOSITION FOR FLUX SENJU METAL INDUSTRY CO (JP) 2022-01-19 EP claimed
US-10556299-B2 Flux and resin composition for flux SENJU METAL INDUSTRY CO., LTD. (JP) 2020-02-11 US claimed
CN-110087823-A Solder flux and solder flux resin combination 千住金属工业株式会社 2019-08-02 CN claimed
CN-108929764-A A kind of semi-synthetic stainless steel coolant and preparation method thereof 广东山之风环保科技有限公司 2018-12-04 CN claimed
US-20150084187-A1 METHODS OF FORMING HYDROPHOBIC SURFACES ON SEMICONDUCTOR DEVICE STRUCTURES, METHODS OF FORMING SEMICONDUCTOR DEVICE STRUCTURES, AND SEMICONDUCTOR DEVICE STRUCTURES MICRON TECHNOLOGY INC (US) 2015-03-26 US claimed
US-8932933-B2 Methods of forming hydrophobic surfaces on semiconductor device structures, methods of forming semiconductor device structures, and semiconductor device structures MICRON TECHNOLOGY, INC. (US) 2015-01-13 US claimed
EP-2704562-A2 HERBICIDAL COMPOSITION COMPRISING PINOXADEN AND FLUROXYPYRESTER, AND METHODS OF USE THEREOF Syngenta Participations AG (CH) 2014-03-12 EP claimed
WO-2012152527-A2 HERBICIDAL COMPOSITION COMPRISING PINOXADEN AND FLUROXYPYR, AND METHODS OF USE THEREOF SYNGENTA PARTICIPATIONS AG (CH) 2012-11-15 WO claimed
US-7638221-B2 Polybenzimidazoles, organic phosphonic acid, and hydrolyzable phosphate compound such as ethyl acid phosphate, methyl acid phosphate, butyl acid phosphate, dibutyl phosphate, monoethyl phosphate, monomethyl phosphate, and mono-n-butyl phosphate SANYO ELECTRIC CO., LTD. (JP) 2009-12-29 US claimed
US-4582636-A A SOAP BUILDER, NONIONIC AND AMPHOTERIC SURFACTANTS, A SOLUBILIZER OR AN ALKALI METAL OCTYL PHOSPHONATE AND WATER COLGATE-PALMOLIVE CO. (US) 1986-04-15 US claimed
US-4294883-A EMULSIFIERS, LUBRICANTS, ANIONIC SURFACTANTS HOECHST FIBERS INDUSTRIES, DIV. OF AMERICAN HOECHST CORPORATION (US) 1981-10-13 US claimed