SCHEMBL412388

SCHEMBL412388

C=COC1CCCO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL414222 0.93
SCHEMBL2232967 0.87
SCHEMBL11208410 0.77
SCHEMBL3623443 0.76
SCHEMBL13665350 0.76
SCHEMBL183810 0.76
Butadiene SCHEMBL616290 0.76
SCHEMBL11664616 0.76
SCHEMBL15803200 0.72
SCHEMBL1145721 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115850640-A Sound-insulation sandwich glass intermediate film and preparation method thereof 长春工业大学 2023-03-28 CN claimed
CN-111304924-B Environment-friendly moisture-absorbing and heating finishing agent 湖南工程学院 2022-07-15 CN claimed
CN-101082772-B Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device JSR CORP 2013-03-06 CN claimed
EP-4722199-A1 AZOLE COMPOUND, METHOD FOR SYNTHESIZING SAID AZOLE COMPOUND, AND USE THEREOF SHIKOKU CHEMICALS CORPORATION (JP) 2026-04-08 EP disclosed
US-20250109101-A1 NAPHTHALENE COMPOUND, SYNTHESIS METHOD THEREFOR, AND COMPOSITION CONTAINING SAID NAPHTHALENE COMPOUND SHIKOKU CHEMICALS CORPORATION (JP) 2025-04-03 US disclosed
WO-2024247919-A1 AZOLE COMPOUND, METHOD FOR SYNTHESIZING SAID AZOLE COMPOUND, AND USE THEREOF 四国化成工業株式会社 2024-12-05 WO disclosed
EP-4464691-A2 NAPHTHALENE COMPOUND, SYNTHESIS METHOD THEREFOR, AND COMPOSITION CONTAINING SAID NAPHTHALENE COMPOUND Shikoku Chemicals Corporation (JP) 2024-11-20 EP disclosed
CN-118541350-A Naphthalene compound, method for synthesizing the same, and composition containing the same 四国化成工业株式会社 2024-08-23 CN disclosed
CN-113316744-B Oxime ester photoinitiators with special aroyl chromophores 巴斯夫欧洲公司 2024-07-30 CN disclosed
CN-115850640-A Sound-insulation sandwich glass intermediate film and preparation method thereof 长春工业大学 2023-03-28 CN disclosed
CN-114539455-B Preparation of polyvinyl ethers by cationic polymerization using continuous flow process and process 中国科学技术大学 2023-03-10 CN disclosed
CN-101082772-A Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device JSR CORP (JP) 2007-12-05 CN disclosed
CN-101046630-A Radiation sensibility composition for forming staining layer, color filter and color liquid crystal display element JSR CORP (JP) 2007-10-03 CN disclosed
US-20070046764-A1 INK-JET RECORDING DEVICE FUJI PHOTO FILM CO., LTD. (JP) 2007-03-01 US disclosed
EP-1757457-A1 Ink-jet recording device Fuji Photo Film Co., Ltd. (JP) 2007-02-28 EP disclosed
US-20070019051-A1 Ink-jet recording device FUJI PHOTO FILM CO., LTD. 2007-01-25 US disclosed
EP-1745935-A2 Ink-jet recording device Fuji Photo Film Co., Ltd. (JP) 2007-01-24 EP disclosed
US-20060204732-A1 Ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate FUJI PHOTO FILM CO., LTD. 2006-09-14 US disclosed
EP-1700890-A2 Ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2006-09-13 EP disclosed
US-20060165919-A1 Coating composition, optical film, anti-reflection film, polarizing plate and image display device using the same FUJI PHOTO FILM CO., LTD. (JP) 2006-07-27 US disclosed