Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.55 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.55 |
| ▸ | MEN1 | O00255 | 4/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.40 |
| ▸ | LMNA | P02545 | 3/20 | 0.40 |
| ▸ | MAPT | P10636 | 3/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 2/20 | 0.33 |
| ▸ | XBP1 | P17861 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | CHRM5 | P08912 | 4/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16994995 | 0.97 | ESR1 (0.52) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL15356195 | 0.93 | ESR1 (0.49) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL4125760 | 0.82 | ESR1 (0.49) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL15926113 | 0.82 | ESR1 (0.43) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL29849984 | 0.82 | ESR1 (0.51) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL22215860 | 0.82 | ESR1 (0.51) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL4134601 | 0.82 | ESR1 (0.41) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL18415977 | 0.81 | ESR1 (0.61) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL4137407 | 0.81 | ESR1 (0.48) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL19563081 | 0.81 | ESR1 (0.38) | ESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2762503-B1 | OPTICAL ELEMENT MATERIAL AND METHOD FOR PRODUCING SAME | MARUZEN PETROCHEM CO LTD (JP) | 2017-11-08 | — | — | EP | disclosed |
| US-9574106-B2 | Optical element material and method for producing same | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2017-02-21 | — | — | US | disclosed |
| US-9574106-B2 | Optical element material and method for producing same | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2017-02-21 | — | — | US | disclosed |
| US-9399693-B2 | Resin composition for photoimprinting, pattern forming process and etching mask | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2016-07-26 | — | — | US | disclosed |
| US-9399693-B2 | Resin composition for photoimprinting, pattern forming process and etching mask | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2016-07-26 | — | — | US | disclosed |
| US-20140287219-A1 | OPTICAL ELEMENT MATERIAL AND METHOD FOR PRODUCING SAME | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2014-09-25 | — | — | US | disclosed |
| US-20140287219-A1 | OPTICAL ELEMENT MATERIAL AND METHOD FOR PRODUCING SAME | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2014-09-25 | — | — | US | disclosed |
| US-20130288021-A1 | RESIN COMPOSITION FOR PHOTOIMPRINTING, PATTERN FORMING PROCESS AND ETCHING MASK | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-10-31 | — | — | US | disclosed |
| US-20130288021-A1 | RESIN COMPOSITION FOR PHOTOIMPRINTING, PATTERN FORMING PROCESS AND ETCHING MASK | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-10-31 | — | — | US | disclosed |
| US-20090068569-A1 | Resin composition for hologram recording material, hologram recording material, and method for producing hologram recording medium | NIPPON PAINT CO., LTD. | 2009-03-12 | — | — | US | disclosed |