SCHEMBL4137295

SCHEMBL4137295

C1=C2CCC2CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10934615 0.92
SCHEMBL1904517 0.90 KDM1A (0.50)
SCHEMBL11683805 0.90 KDM1A (0.45)
SCHEMBL122872 0.90 KDM1A (0.50)
SCHEMBL8361882 0.88 KDM1A (0.48)
SCHEMBL235344 0.88 KDM1A (0.48)
SCHEMBL5699292 0.88 KDM1A (0.48)
SCHEMBL20552191 0.88 KDM1A (0.48)
SCHEMBL216035 0.88 KDM1A (0.48)
SCHEMBL6682662 0.88 KDM1A (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2840080-B1 NITROGEN-CONTAINING HETEROCYCLIC COMPOUND OR SALT THEREOF FUJIFILM CORP (JP) 2017-12-06 EP claimed
EP-3195866-B1 PHARMACEUTICAL COMPOSITION FOR TREATING FLT3 MUTATION-POSITIVE CANCER, MUTANT FLT3 INHIBITOR AND USES THEREOF FUJIFILM CORP (JP) 2020-11-18 EP disclosed
US-9987278-B2 Pharmaceutical composition for treating FLT3 mutation-positive cancer, mutant FLT3 inhibitor and uses thereof FUJIFILM CORPORATION (JP) 2018-06-05 US disclosed
EP-2840080-B1 NITROGEN-CONTAINING HETEROCYCLIC COMPOUND OR SALT THEREOF FUJIFILM CORP (JP) 2017-12-06 EP disclosed
EP-3195866-A1 PHARMACEUTICAL COMPOSITION FOR TREATING FLT3 MUTATION-POSITIVE CANCER, FLT3 MUTANT INHIBITOR, AND USE OF SAID PHARMACEUTICAL COMPOSITION AND SAID INHIBITOR Fujifilm Corporation (JP) 2017-07-26 EP disclosed
US-20170165262-A1 PHARMACEUTICAL COMPOSITION FOR TREATING FLT3 MUTATION-POSITIVE CANCER, MUTANT FLT3 INHIBITOR AND USES THEREOF FUJIFILM CORPORATION (JP) 2017-06-15 US disclosed
US-9145415-B2 Nitrogen-containing heterocyclic compound or salt thereof FUJIFILM CORPORATION (JP) 2015-09-29 US disclosed
EP-2840080-A1 NITROGEN-CONTAINING HETEROCYCLIC COMPOUND OR SALT THEREOF Fujifilm Corporation (JP) 2015-02-25 EP disclosed
US-20150045339-A1 NITROGEN-CONTAINING HETEROCYCLIC COMPOUND OR SALT THEREOF FUJIFILM CORPORATION (JP) 2015-02-12 US disclosed
EP-2022793-B1 NOVEL HETEROCYCLIC COMPOUND OR SALT THEREOF AND INTERMEDIATE THEREOF TOYAMA CHEMICAL CO LTD (JP) 2014-06-04 EP disclosed
US-8367831-B2 Heterocyclic compound or salt thereof and intermediate thereof TOYAMA CHEMICAL CO., LTD. (JP) 2013-02-05 US disclosed
US-20120226035-A1 NOVEL HETEROCYCLIC COMPOUND OR SALT THEREOF AND INTERMEDIATE THEREOF TAISHO PHARMACEUTICAL CO., LTD. (JP) 2012-09-06 US disclosed
US-8211908-B2 Heterocyclic compound or salt thereof and intermediate thereof TOYAMA CHEMICAL CO., LTD. (JP) 2012-07-03 US disclosed
US-20090198063-A1 NOVEL HETEROCYCLIC COMPOUND OR SALT THEREOF AND INTERMEDIATE THEREOF TOYAMA CHEMICAL CO., LTD. (JP) 2009-08-06 US disclosed
EP-2022793-A1 NOVEL HETEROCYCLIC COMPOUND OR SALT THEREOF AND INTERMEDIATE THEREOF TOYAMA CHEMICAL CO., LTD. (JP) 2009-02-11 EP disclosed