SCHEMBL4140895

SCHEMBL4140895

CC(F)(CF)OF

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7674476 0.76
SCHEMBL17169667 0.73
SCHEMBL6430557 0.71
SCHEMBL92037 0.69
SCHEMBL11989184 0.69
SCHEMBL12224272 0.67
SCHEMBL92168 0.65
SCHEMBL11486026 0.65
SCHEMBL2036521 0.65
SCHEMBL620238 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240030473-A1 ELECTROLYTE MATERIAL, MEMBRANE ELECTRODE ASSEMBLY AND POLYMER ELECTROLYTE FUEL CELL AGC Inc. (JP) 2024-01-25 US disclosed
US-9518140-B2 Process for production of fluorine-containing block copolymer DAIKIN INDUSTRIES, LTD. (JP) 2016-12-13 US disclosed
US-9441107-B2 Shaped product suppressed in bleeding and production process therefor NIPPON VALQUA INDUSTRIES, LTD. (JP) 2016-09-13 US disclosed
US-20160159961-A1 PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING BLOCK COPOLYMER DAIKIN INDUSTRIES, LTD. (JP) 2016-06-09 US disclosed
US-9290628-B2 Process for production of fluorine-containing block copolymer DAIKIN INDUSTRIES, LTD. (JP) 2016-03-22 US disclosed
US-9223200-B2 Pellicle for lithography, pellicle-mounted photomask, and exposure treatment method ASAHI GLASS COMPANY, LIMITED (JP) 2015-12-29 US disclosed
US-20150329683-A1 PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING BLOCK COPOLYMER DAIKIN INDUSTRIES, LTD. (JP) 2015-11-19 US disclosed
US-9127111-B2 Process for production of fluorine-containing block copolymer DAIKIN INDUSTRIES, LTD. (JP) 2015-09-08 US disclosed
US-20150240075-A1 Shaped Product Suppressed in Breeding and Production Process Therefor VALQUA, LTD. (JP) 2015-08-27 US disclosed
US-9012025-B2 Fuser member XEROX CORPORATION (US) 2015-04-21 US disclosed
US-20140147773-A1 PELLICLE FOR LITHOGRAPHY, PELLICLE-MOUNTED PHOTOMASK, AND EXPOSURE TREATMENT METHOD ASAHI GLASS COMPANY, LIMITED (JP) 2014-05-29 US disclosed
US-20130266803-A1 FUSER MEMBER XEROX CORPORATION (US) 2013-10-10 US disclosed
US-20120156504-A1 COATING MATERIAL COMPOSITION FOR LIQUID IMMERSION EXPOSURE APPARATUS, LAMINATE, METHOD FOR FORMING LAMINATE, AND LIQUID IMMERSION EXPOSURE APPARATUS ASAHI GLASS COMPANY, LIMITED 2012-06-21 US disclosed
US-20120108756-A1 PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING BLOCK COPOLYMER DAIKIN INDUSTRIES, LTD. (JP) 2012-05-03 US disclosed
US-20110087317-A1 CONDUCTIVE POLYMERIC COATING WITH OPTIONAL BIOBENEFICIAL TOPCOAT FOR A MEDICAL LEAD BORGAONKAR HARSHAD 2011-04-14 US disclosed