SCHEMBL41470

SCHEMBL41470

CO[SiH](C)O[Si](C)(C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12199453 0.95
SCHEMBL12680904 0.90
SCHEMBL18388971 0.89
SCHEMBL12680902 0.88
SCHEMBL12680914 0.86
SCHEMBL12680915 0.86
SCHEMBL7896532 0.86
SCHEMBL12680916 0.84
SCHEMBL15678746 0.83
SCHEMBL9999985 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180016791-A1 SILICONE MEMBRANES AMRIZE TECHNOLOGY SWITZERLAND LLC (CH) 2018-01-18 US disclosed
US-9657181-B2 Composition for antistatic release agent and antistatic release film SHIN-ETSU POLYMER CO., LTD. (JP) 2017-05-23 US disclosed
US-20170015864-A1 PRIMER SILICONE COMPOSITION AND TREATED PAPER OR FILM FOR RELEASE PAPER OR FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-01-19 US disclosed
US-9365746-B2 Silicone composition, release paper or film, and making method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-14 US disclosed
US-20150322273-A1 COMPOSITION FOR ANTISTATIC RELEASE AGENT AND ANTISTATIC RELEASE FILM SHIN-ETSU POLYMER CO., LTD. (JP) 2015-11-12 US disclosed
US-8283422-B2 Polyethersiloxanes carrying alkoxysilyl groups and method for production thereof EVONIK GOLDSCHMIDT GMBH (DE) 2012-10-09 US disclosed
US-20110274935-A1 SILICONE COMPOSITION, RELEASE PAPER OR FILM, AND MAKING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-11-10 US disclosed
US-20110274934-A1 PRIMER SILICONE COMPOSITION AND TREATED PAPER OR FILM FOR RELEASE PAPER OR FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-11-10 US disclosed
US-20110245412-A1 Novel Polyethersiloxanes Carrying Alkoxysilyl Groups and Method for Production Thereof EVONIK DEGUSSA GMBH (DE) 2011-10-06 US disclosed
US-20100063310-A1 Functionalized silicon compounds KNEPPER JEFFREY A 2010-03-11 US disclosed