SCHEMBL4150127

SCHEMBL4150127

c1ccc2c(c1)=Nc1cc3c(cc1=2)OCN=3

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL550600 0.74
SCHEMBL4137855 0.71 CYP1A2 (0.31)
SCHEMBL4148188 0.68
SCHEMBL3173360 0.66 IDO1 (0.31)
SCHEMBL4501415 0.64
SCHEMBL4148209 0.63
SCHEMBL4502073 0.63 TDP1 (0.31)
SCHEMBL4503493 0.62
SCHEMBL14118008 0.62 AHR (0.41)
SCHEMBL30977970 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090092766-A1 GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2009-04-09 US disclosed
WO-2006123834-A2 GRAFT PATTERN FORMING METHOD AND CONDUCTIVE PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2006-11-23 WO disclosed
EP-1061411-B1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO LTD (JP) 2006-10-11 EP disclosed
EP-1067430-B1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO LTD (JP) 2006-09-13 EP disclosed
US-20050271987-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. 2005-12-08 US disclosed
US-6838231-B2 Production process of silver halide photographic emulsion and silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 2005-01-04 US disclosed
US-20040166450-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. 2004-08-26 US disclosed
US-6780577-B2 A MULTILAYER COMPRISING PHOTOSENSITIVE DYES WITH ABSORPTION SPECTRA AT A HIGH FLUORESCENCE WAVELENGTH FUJI PHOTO FILM CO., LTD. (JP) 2004-08-24 US disclosed
US-6730468-B1 ADSORBED ON SURFACE A SENSITIZING DYE IN MULTIPLE LAYERS FUJI PHOTO FILM CO., LTD. (JP) 2004-05-04 US disclosed
US-6692905-B2 COLOR PHOTOGRAPHY FUJI PHOTO FILM CO., LTD. (JP) 2004-02-17 US disclosed
US-20030180673-A1 Production process of silver halide photographic emulsion and silver halide photographic light-sensitive material FUJI PHOTO FILM CO., LTD. 2003-09-25 US disclosed
US-20030170575-A1 Silver halide photographic material FUJI PHOTO FILM CO., LTD. 2003-09-11 US disclosed
US-6582894-B1 Silver haide photographic emulsion and photographic light-sensitive material using same FUJI PHOTO FILM CO., LTD. (JP) 2003-06-24 US disclosed
US-6521401-B1 Spectrally sensitizing with dye that does not have electric charge or forms an inner salt FUJI PHOTO FILM CO., LTD. (JP) 2003-02-18 US disclosed
US-6465166-B1 HIGH SPEED SILVER HALIDE PHOTOGRAPHIC EMULSION WHEREIN THE GRAIN AGGLOMERATION IS PREVENTED AND PHOTOGRAPHIC MATERIAL REDUCED IN RESIDUAL DYE COLOR AFTER PROCESSING FUJI PHOTO FILM. CO., LTD. (JP) 2002-10-15 US disclosed
US-20020012892-A1 Methine compound-containing silver halide photographic emulsion and photographic material using the same FUJIFILM CORPORATION (JP) 2002-01-31 US disclosed
EP-1067430-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. (JP) 2001-01-10 EP disclosed
EP-1061411-A1 Silver halide photographic emulsion and photographic light-sensitive material using the same FUJI PHOTO FILM CO., LTD. (JP) 2000-12-20 EP disclosed