SCHEMBL4157757

SCHEMBL4157757

O=C([Ru])C1=CC=CC1.[H-].[H-]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27285473 0.77 TSHR (0.31)
SCHEMBL4157755 0.76
SCHEMBL3292543 0.76
SCHEMBL4152375 0.76
SCHEMBL890924 0.75
SCHEMBL29090492 0.75 TSHR (0.30)
SCHEMBL2738379 0.75
SCHEMBL4165668 0.74
SCHEMBL490190 0.73
SCHEMBL10054658 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090022891-A1 METHOD OF FORMING METAL FILM JSR CORPORATION (JP) 2009-01-22 US disclosed
EP-1995347-A1 METHOD OF FORMING METAL FILM JSR Corporation (JP) 2008-11-26 EP disclosed
US-7238822-B2 Ruthenium compound and process for producing a metal ruthenium film JSR CORPORATION (JP) 2007-07-03 US disclosed
US-20060240190-A1 Ruthenium compound and process for producing a metal ruthenium film JSR CORPORATION (JP) 2006-10-26 US disclosed