SCHEMBL4165113

SCHEMBL4165113

CC1(C)C[CH]OC1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL127168 0.59 — —
SCHEMBL10782642 0.58 TP53 (0.38) —
SCHEMBL11838388 0.58 — —
SCHEMBL530127 0.58 — —
Hydrochloric Acid SCHEMBL28633529 0.57 — —
SCHEMBL14175630 0.57 TP53 (0.42) —
SCHEMBL2691041 0.57 — —
SCHEMBL11566187 0.56 — —
SCHEMBL17578246 0.56 TP53 (0.32) —
SCHEMBL149596 0.56 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 — — US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 — — US disclosed
EP-1557718-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-07-27 — — EP disclosed
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