Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 1/20 | 0.32 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.30 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.30 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL863207 | 0.94 | EPHX2 (0.33) | EPHX2ADRB2ADRB1ADRB3MEN1 | |
| SCHEMBL987158 | 0.94 | EPHX2 (0.33) | EPHX2ADRB2ADRB1ADRB3MEN1 | |
| SCHEMBL317547 | 0.94 | EPHX2 (0.33) | EPHX2ADRB2ADRB1ADRB3MEN1 | |
| SCHEMBL76364 | 0.94 | EPHX2 (0.33) | EPHX2ADRB2ADRB1ADRB3MEN1 | |
| SCHEMBL863208 | 0.94 | EPHX2 (0.33) | EPHX2ADRB2ADRB1ADRB3MEN1 | |
| SCHEMBL985625 | 0.94 | EPHX2 (0.33) | EPHX2ADRB2ADRB1ADRB3MEN1 | |
| SCHEMBL863289 | 0.94 | EPHX2 (0.33) | EPHX2ADRB2ADRB1ADRB3MEN1 | |
| SCHEMBL987686 | 0.94 | EPHX2 (0.33) | EPHX2ADRB2ADRB1ADRB3MEN1 | |
| SCHEMBL17133787 | 0.86 | — | — | |
| SCHEMBL17133774 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8278021-B2 | Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-10-02 | — | — | US | claimed |
| US-20090030103-A1 | METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-01-29 | — | — | US | claimed |
| US-10303054-B2 | Photosensitive resin composition, photosensitive resin layer using the same and display device | SAMSUNG SDI CO., LTD. (KR) | 2019-05-28 | — | — | US | disclosed |
| US-20180196169-A1 | HARD-COATING FILM FOR DISPLAY DEVICE, AND DISPLAY DEVICE COMPRISING SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-07-12 | — | — | US | disclosed |
| EP-3315545-A1 | HARD-COATING FILM FOR DISPLAY DEVICE, AND DISPLAY DEVICE COMPRISING SAME | Samsung Electronics Co., Ltd. (KR) | 2018-05-02 | — | — | EP | disclosed |
| US-20180017866-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND DISPLAY DEVICE | SAMSUNG SDI CO., LTD. (KR) | 2018-01-18 | — | — | US | disclosed |
| US-9599898-B2 | Black photosensitive resin composition and light-blocking layer using the same | CHEIL INDUSTRIES INC. (KR) | 2017-03-21 | — | — | US | disclosed |
| US-9429842-B2 | Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device | SAMSUNG SDI CO., LTD. (KR) | 2016-08-30 | — | — | US | disclosed |
| US-9405188-B2 | Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device | SAMSUNG SDI CO., LTD. (KR) | 2016-08-02 | — | — | US | disclosed |
| US-9329475-B2 | Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device | CHEIL INDUSTRIES INC. (KR) | 2016-05-03 | — | — | US | disclosed |
| US-20150177617-A1 | Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device | SAMSUNG SDI CO., LTD. (KR) | 2015-06-25 | — | — | US | disclosed |
| US-20090030103-A1 | METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-01-29 | — | — | US | disclosed |
| US-7371698-B2 | Method of forming film pattern, active matrix substrate, electro-optic device, and electronic apparatus | SEIKO EPSON CORPORATION (JP) | 2008-05-13 | — | — | US | disclosed |
| US-20060270082-A1 | METHOD OF FORMING FILM PATTERN, ACTIVE MATRIX SUBSTRATE, ELECTRO-OPTIC DEVICE, AND ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2006-11-30 | — | — | US | disclosed |
| US-20050282021-A1 | Composition for forming coating film comprising carbosilane based polymer and coating film obtained from the composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-12-22 | — | — | US | disclosed |
| EP-0914393-B1 | INK COMPOSITION | BIC CORP (US) | 2001-09-26 | — | — | EP | disclosed |
| EP-0914393-A1 | INK COMPOSITION | BIC CORPORATION (US) | 1999-05-12 | — | — | EP | disclosed |
| US-5769931-A | WELAN GUM OR RHAMSAN GUM SHEAR THINNER | BIC CORPORATION (US) | 1998-06-23 | — | — | US | disclosed |
| WO-1998004641-A1 | INK COMPOSITION | BIC CORPORATION (US) | 1998-02-05 | — | — | WO | disclosed |
| US-5466281-A | Water-based ink composition for ball-point pen | NATIONAL INK INCORPORATED (US) | 1995-11-14 | — | — | US | disclosed |