Trolamine

Trolamine

SCHEMBL4173719

CN(CCO)CCO.OCCN(CCO)CCO

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.50
CA12 O43570 1/20 0.37
CA2 P00918 1/20 0.37
CA3 P07451 1/20 0.37
CA4 P22748 1/20 0.37
CA6 P23280 1/20 0.37
CA5A P35218 1/20 0.37
CA7 P43166 1/20 0.37
CA9 Q16790 1/20 0.37
CA14 Q9ULX7 1/20 0.37
CA5B Q9Y2D0 1/20 0.37
HSD17B10 Q99714 2/20 0.36
HPGD P15428 2/20 0.36
MAPK1 P28482 2/20 0.36
CYP1A2 P05177 1/20 0.36
CYP2C9 P11712 1/20 0.36
HIF1A Q16665 1/20 0.36
KDM4E B2RXH2 5/20 0.33
LMNA P02545 2/20 0.33
HTT P42858 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13201991 0.94 MAPT (0.45) MAPTCA12CA2CA3CA4
SCHEMBL20835926 0.94 MAPT (0.45) MAPTCA12CA2CA3CA4
SCHEMBL13989311 0.94 MAPT (0.45) MAPTCA12CA2CA3CA4
SCHEMBL17401300 0.90 MAPT (0.47) MAPTCA12CA2CA3CA4
SCHEMBL17605 0.89
SCHEMBL6233208 0.89 MAPT (0.41) MAPTCA12CA2CA3CA4
SCHEMBL18986519 0.87 CHRM2 (0.44) MAPTTSHRALDH1A1THRATHRB
Trolamine SCHEMBL5918852 0.86 MAPT (0.56) MAPTCA12CA2CA9HSD17B10
Ammonia Solution, Strong SCHEMBL3796062 0.86
Water SCHEMBL1283690 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108912835-A ink-jet printing water-based UV-L ED ink binder and preparation method thereof 西安理工大学 2018-11-30 CN claimed
CN-108359313-A Ink-jet printing water-based UV-L ED ink and preparation method thereof 西安理工大学 2018-08-03 CN claimed
US-8519408-B2 Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate SAMSUNG DISPLAY CO., LTD. (KR) 2013-08-27 US claimed
US-20120328991-A1 METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-12-27 US claimed
US-20090030103-A1 METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-01-29 US claimed
CN-118179257-A Method for strengthening mass transfer of membrane contactor based on falling liquid film flow and calculating method of thickness of falling liquid film 南京工业大学 2024-06-14 CN disclosed
CN-108912835-A ink-jet printing water-based UV-L ED ink binder and preparation method thereof 西安理工大学 2018-11-30 CN disclosed
CN-108359313-A Ink-jet printing water-based UV-L ED ink and preparation method thereof 西安理工大学 2018-08-03 CN disclosed
CN-107353705-A Gravure water-based LED-UV ink and preparation method thereof 中山火炬职业技术学院 2017-11-17 CN disclosed
US-20140312285-A1 COMPOSITION FOR BONDING BANDO CHEMICAL INDUSTRIES, LTD. (JP) 2014-10-23 US disclosed
EP-1745844-B1 IMPURITY DISPOSAL SYSTEM AND METHOD MITSUBISHI HEAVY IND LTD (JP) 2013-05-29 EP disclosed
US-7544337-B2 Purifiying a mixture of oil/natural gas by removing gaseous impurities (carbon dioxide, hydrogen sulfide), compressing and removing water to produce a dried gas; disposal into an underground aquifer; pollution control; reuse of waste heat and carbon dioxide exhaust; CO2 sequestration; pipe durability MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) 2009-06-09 US disclosed
EP-1745844-A1 IMPURITY DISPOSAL SYSTEM AND METHOD Mitsubishi Heavy Industries, Ltd. (JP) 2007-01-24 EP disclosed
US-20060177364-A1 Purifiying a mixture of oil/natural gas by removing gaseous impurities (carbon dioxide, hydrogen sulfide), compressing and removing water to produce a dried gas; disposal into an underground aquifer; pollution control; reuse of waste heat and carbon dioxide exhaust; CO2 sequestration; pipe durability MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) 2006-08-10 US disclosed
EP-1242391-B1 STABILIZER MIXTURE CIBA SC HOLDING AG (CH) 2006-02-22 EP disclosed
US-5118721-A Dispersion of filler in hydroxy group containing polymer; then in situ polymerization POLYOL INTERNATIONAL, B.V. (NL) 1992-06-02 US disclosed
EP-0358427-A2 Dispersion polymer polyols POLYOL INTERNATIONAL B.V. (NL) 1990-03-14 EP disclosed
US-4416950-A COATING WITH A DICYCLOPENTENYL ACRYLATE MONOMER AND POLYMERIZING ANDREWS PAPER & CHEMICAL CO. (US) 1983-11-22 US disclosed