⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1533017 | 0.84 | — | — | |
| SCHEMBL4007322 | 0.82 | KDM4E (0.30) | — | |
| SCHEMBL1252464 | 0.80 | — | — | |
| SCHEMBL1250887 | 0.80 | — | — | |
| SCHEMBL4007264 | 0.80 | — | — | |
| SCHEMBL209031 | 0.80 | — | — | |
| SCHEMBL208592 | 0.80 | — | — | |
| SCHEMBL3015999 | 0.80 | — | — | |
| SCHEMBL21268479 | 0.80 | — | — | |
| SCHEMBL2231770 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 99 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121572702-A | Nanofiber fluorine film composite fabric and preparation process thereof | 昆山华阳新材料股份有限公司 | 2026-02-27 | — | — | CN | claimed |
| CN-114469764-B | Fullerene and powder functional compound and preparation method and application thereof | 上海蔻沣生物科技有限公司 | 2024-04-05 | — | — | CN | claimed |
| CN-115010932-B | Hydrophobic oleophobic fluorine-containing microsphere and preparation method thereof | 上海睿思畅科技发展有限公司 | 2023-11-03 | — | — | CN | claimed |
| CN-116217124-A | Permeable concrete durability permeable reinforcing agent and preparation method thereof | 呼和浩特市巨日特种化工建材有限公司 | 2023-06-06 | — | — | CN | claimed |
| CN-114469764-A | Fullerene and powder functional compound and preparation method and application thereof | 上海蔻沣生物科技有限公司 | 2022-05-13 | — | — | CN | claimed |
| CN-121572702-A | Nanofiber fluorine film composite fabric and preparation process thereof | 昆山华阳新材料股份有限公司 | 2026-02-27 | — | — | CN | disclosed |
| CN-118440701-A | Hydrophobic oleophobic microsphere, tracer and preparation method thereof | 苏州星烁纳米科技有限公司 | 2024-08-06 | — | — | CN | disclosed |
| CN-111948744-B | Film-attached curved substrate, method for producing the same, and image display device | ＡＧＣ株式会社 | 2023-05-09 | — | — | CN | disclosed |
| CN-115398282-A | Substrate with anti-glare film and method for producing substrate with anti-glare film | ＡＧＣ株式会社 | 2022-11-25 | — | — | CN | disclosed |
| US-11498043-B2 | Methods for producing wet gel and xerogel | AGC Inc. (JP) | 2022-11-15 | — | — | US | disclosed |
| CN-112739775-B | Curable composition, cured product, and method for using curable composition | 琳得科株式会社 | 2022-11-01 | — | — | CN | disclosed |
| WO-2022209064-A1 | ADHESIVE PASTE, METHOD FOR USING ADHESIVE PASTE, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | リンテック株式会社 | 2022-10-06 | — | — | WO | disclosed |
| US-20080241474-A1 | PROCESS FOR PRODUCING DISPERSION OF HOLLOW FINE SIO2 PARTICLES, COATING COMPOSITION AND SUBSTRATE WITH ANTIREFLECTION COATING FILM | ASAHI GLASS COMPANY LIMITED (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080124539-A1 | DISPERSION CONTAINING HOLLOW SIO2, COATING COMPOSITION AND SUBSTRATE WITH ANTIREFLECTION COATING FILM | ASAHI GLASS CO., LTD. (JP) | 2008-05-29 | — | — | US | disclosed |
| EP-1887059-A1 | DISPERSION CONTAINING HOLLOW SiO2, COATING COMPOSITION, AND SUBSTRATE WITH ANTIREFLECTION COATING FILM | ASAHI GLASS COMPANY, LTD. (JP) | 2008-02-13 | — | — | EP | disclosed |
| EP-1886972-A1 | PROCESS FOR PRODUCING DISPERSION OF HOLLOW FINE SiO2 PARTICLES, COATING COMPOSITION, AND SUBSTRATE WITH ANTIREFLECTION COATING FILM | Asahi Glass Company, Limited (JP) | 2008-02-13 | — | — | EP | disclosed |
| US-20050014438-A1 | Electron emitting device, electron source, image forming apparatus and producing methods of them | CANON KABUSHIKI KAISHA (JP) | 2005-01-20 | — | — | US | disclosed |
| US-6827619-B2 | Electron emitting device, electron source, image forming apparatus and producing methods of them | CANON KABUSHIKI KAISHA (JP) | 2004-12-07 | — | — | US | disclosed |
| US-20030020395-A1 | Electron emitting device, electron source, image forming apparatus and producing methods of them | ODA HITOSHI (JP) | 2003-01-30 | — | — | US | disclosed |
| US-6492769-B1 | Electron emitting device, electron source, image forming apparatus and producing methods of them | CANON KABUSHIKI KAISHA (JP) | 2002-12-10 | — | — | US | disclosed |