SCHEMBL4185166

SCHEMBL4185166

C=CC(=O)N1C=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8865924 0.75
SCHEMBL10664271 0.75
SCHEMBL31506740 0.75
SCHEMBL1042812 0.73
SCHEMBL19149423 0.72 NPC1 (0.31)
SCHEMBL40708 0.71
SCHEMBL30532723 0.71
Hydrochloric Acid SCHEMBL29508586 0.71
SCHEMBL30675167 0.71
SCHEMBL4788208 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110462797-B Polishing composition 福吉米株式会社 2023-09-22 CN disclosed
WO-2022070516-A1 METHOD FOR PRODUCING SEMICONDUCTOR WETTING AGENT CONTAINING POLY(VINYL ALCOHOL) COMPOSITION, POLISHING COMPOSITION CONTAINING SEMICONDUCTOR WETTING AGENT OBTAINED USING THIS PRODUCTION METHOD, AND METHOD FOR PRODUCING POLISHING COMPOSITION 株式会社フジミインコーポレーテッド 2022-04-07 WO disclosed
WO-2022070801-A1 GRINDING COMPOSITION AND USE THEREOF 株式会社フジミインコーポレーテッド 2022-04-07 WO disclosed
WO-2022065022-A1 POLISHING COMPOSITION AND USE THEREFOR 株式会社フジミインコーポレーテッド 2022-03-31 WO disclosed
WO-2021039585-A1 POLARIZATION FILM LAMINATE PROVIDED WITH ADHESIVE LAYER, AND OPTICAL DISPLAY PANEL IN WHICH POLARIZATION FILM LAMINATE PROVIDED WITH ADHESIVE LAYER IS USED 日東電工株式会社 2021-03-04 WO disclosed
WO-2021039583-A1 POLARIZING FILM LAMINATE WITH ADHESIVE LAYER AND OPTICAL DISPLAY PANEL IN WHICH SAID POLARIZING FILM LAMINATE WITH ADHESIVE LAYER IS USED 日東電工株式会社 2021-03-04 WO disclosed
WO-2020255921-A1 POLISHING COMPOSITION 株式会社フジミインコーポレーテッド 2020-12-24 WO disclosed
EP-0524786-B1 Hardenable compositions, aqueous gels and processes of making them and applications of said gels MITSUI CHEMICALS INC (JP) 2009-02-18 EP disclosed
EP-0758658-B1 Redispersible polymer and production process thereof MITSUI CHEMICALS INC (JP) 2003-04-23 EP disclosed
US-6090892-A THE RECURRING UNIT CONTAINS A SPECIFIC AMIDO GROUP AND/OR A PARTICULAR HYDROXYL GROUP AS A PENDANT GROUP. MITSUI TOATSU CHEMICALS, INC. (JP) 2000-07-18 US disclosed
US-5624998-A Hardenable composition, aqueous gel and applications MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1997-04-29 US disclosed
EP-0758658-A2 Redispersible polymer and production process thereof MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1997-02-19 EP disclosed
US-5519088-A ACRYLAMIDE DERIVATIVE, METAL PARTICLES, THERMAL INSULATION MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1996-05-21 US disclosed
EP-0524786-A1 Hardenable compositions, aqueous gels and processes of making them and applications of said gels MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-01-27 EP disclosed