⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29668482 | 1.00 | — | — | |
| SCHEMBL2360937 | 0.79 | — | — | |
| SCHEMBL9670441 | 0.79 | — | — | |
| SCHEMBL25914919 | 0.75 | — | — | |
| SCHEMBL28820820 | 0.75 | — | — | |
| SCHEMBL19899743 | 0.75 | — | — | |
| SCHEMBL27959018 | 0.75 | — | — | |
| SCHEMBL31148190 | 0.75 | — | — | |
| SCHEMBL27975774 | 0.75 | — | — | |
| SCHEMBL29655645 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116322616-A | Hair lightening compositions providing damage protection and sensory benefits and methods of use | 欧莱雅 | 2023-06-23 | — | — | CN | disclosed |
| CN-110115116-B | Method for forming solderable solder deposits on contact pads | 德国艾托特克公司 | 2022-05-27 | — | — | CN | disclosed |
| US-11032914-B2 | Method of forming a solderable solder deposit on a contact pad | ATOTECH DEUTSCHLAND GMBH (DE) | 2021-06-08 | — | — | US | disclosed |
| EP-3560304-B1 | METHOD OF FORMING A SOLDERABLE SOLDER DEPOSIT ON A CONTACT PAD | ATOTECH DEUTSCHLAND GMBH (DE) | 2021-02-03 | — | — | EP | disclosed |
| US-20190350088-A1 | METHOD OF FORMING A SOLDERABLE SOLDER DEPOSIT ON A CONTACT PAD | ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH) (DE) | 2019-11-14 | — | — | US | disclosed |
| EP-3560304-A1 | METHOD OF FORMING A SOLDERABLE SOLDER DEPOSIT ON A CONTACT PAD | ATOTECH Deutschland GmbH (DE) | 2019-10-30 | — | — | EP | disclosed |
| CN-110115116-A | Method for forming solderable solder deposits on contact pads | 德国艾托特克公司 | 2019-08-09 | — | — | CN | disclosed |
| EP-2377376-B1 | METHOD TO FORM SOLDER DEPOSITS ON SUBSTRATES | ATOTECH DEUTSCHLAND GMBH (DE) | 2019-08-07 | — | — | EP | disclosed |
| EP-2520977-B1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2017-11-22 | — | — | EP | disclosed |
| US-8883391-B2 | Positive type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2014-11-11 | — | — | US | disclosed |
| WO-2010046235-A1 | METHOD TO FORM SOLDER DEPOSITS ON SUBSTRATES | ATOTECH DEUTSCHLAND GMBH (DE) | 2010-04-29 | — | — | WO | disclosed |
| WO-2009153516-A1 | NOVEL DERIVATIVES OF PYRROLOINDOLE INHIBITORS OF HSP90, COMPOSITIONS CONTAINING SAME, AND USE THEREOF | SANOFI-AVENTIS (FR) | 2009-12-23 | — | — | WO | disclosed |
| WO-2009122034-A2 | NOVEL HSP90 INHIBITORY CARBAZOLE DERIVATIVES, COMPOSITIONS CONTAINING SAME, AND USE THEREOF | SANOFI-AVENTIS (FR) | 2009-10-08 | — | — | WO | disclosed |
| US-20080275154-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | SAKAYORI KATSUYA | 2008-11-06 | — | — | US | disclosed |
| US-7410746-B2 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2008-08-12 | — | — | US | disclosed |
| US-20070049599-A1 | Use of bh4 for the treatment of respiratory diseases | ALTANA PHARMA AG (DE) | 2007-03-01 | — | — | US | disclosed |
| EP-1682148-A1 | USE OF BH4 FOR THE TREATMENT OF RESPIRATORY DISEASES | ALTANA Pharma AG (DE) | 2006-07-26 | — | — | EP | disclosed |
| WO-2005041975-A1 | USE OF BH4 FOR THE TREATMENT OF RESPIRATORY DISEASES | ALTANA PHARMA AG (DE) | 2005-05-12 | — | — | WO | disclosed |
| US-20040023159-A1 | Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-02-05 | — | — | US | disclosed |
| US-6524770-B1 | For polyimide precursor curable under patternwise low radiation; heat and chemical resistance; polyamide having unsaturated ester pendant groups cures | HITACHI CHEMICAL CO., LTD. (JP) | 2003-02-25 | — | — | US | disclosed |