SCHEMBL4192165

SCHEMBL4192165

CCCCCCCCNC(N)=S

nearest known ligand 0.57

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 9/20 0.54
CASP2 P42575 1/20 0.48
ZDHHC20 Q5W0Z9 1/20 0.45
ZDHHC2 Q9UIJ5 1/20 0.45
NAAA Q02083 1/20 0.45
SPHK1 Q9NYA1 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11239318 1.00 EPHX1 (0.54) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL7263327 1.00 EPHX1 (0.54) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL7264211 1.00 EPHX1 (0.54) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL5570327 1.00 EPHX1 (0.54) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL7263400 1.00 EPHX1 (0.54) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL7271266 1.00 EPHX1 (0.54) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL7269038 1.00 EPHX1 (0.54) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL4611732 1.00 EPHX1 (0.54) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL199562 1.00 EPHX1 (0.54) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL7262848 1.00 EPHX1 (0.54) EPHX1CASP2ZDHHC20ZDHHC2NAAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115105416-B Acrylic ester composite resin composition and preparation method and application thereof 爱迪特(秦皇岛)科技股份有限公司 2023-11-21 CN claimed
CN-115105416-A Acrylate composite resin composition and preparation method and application thereof 爱迪特(秦皇岛)科技股份有限公司 2022-09-27 CN claimed
CN-106132380-B Photopolymerizable dual-cure dental materials based on thiourea derivatives 义获嘉伟瓦登特公司 2020-02-11 CN claimed
CN-106132381-B It is used to prepare the monomer mixture of dental material 义获嘉伟瓦登特公司 2019-11-19 CN claimed
EP-2921156-B1 Monomer mixture for the preparation of dental materials IVOCLAR VIVADENT AG (LI) 2019-10-02 EP claimed
CN-106103348-B The purposes of sulphur compound and selenium compound as the precursor of nano structural material 哥伦比亚大学(纽约)理事会 2018-07-31 CN claimed
EP-2921154-B1 Photopolymerisable and dual hardening dental material based on thiourea derivatives and bisacyldialkylgermanium-compounds IVOCLAR VIVADENT AG (LI) 2017-03-08 EP claimed
EP-4685163-A1 TWO-COMPONENT CURABLE COMPOSITION AND CURED PRODUCT Cosmo Oil Lubricants Co., Ltd. (JP) 2026-01-28 EP disclosed
WO-2024195843-A1 TWO-COMPONENT CURABLE COMPOSITION AND CURED PRODUCT コスモ石油ルブリカンツ株式会社 2024-09-26 WO disclosed
CN-117917236-A Storage-stable self-adhesive composite cements with good transparency and good radiopacity 义获嘉伟瓦登特公司 2024-04-23 CN disclosed
CN-115105416-B Acrylic ester composite resin composition and preparation method and application thereof 爱迪特(秦皇岛)科技股份有限公司 2023-11-21 CN disclosed
US-20230320941-A1 DENTAL COMPOSITION, KIT AND METHOD FOR USE AS ALTERNATIVE RESTORATIVE MATERIAL TO DENTAL AMALGAM SDI LIMITED (AU) 2023-10-12 US disclosed
US-20230274853-A1 THIN METAL ELECTRODE FILMS, AND MANUFACTURING METHOD THEREOF CLAP CO., LTD (KR) 2023-08-31 US disclosed
US-5153331-A Reacting 6-epoxyethyl-3-oxatricyclo 3.2.1.0(2,4)!octane with a thiocyanate salt and/or a thiourea NIPPON OIL COMPANY, LTD. (JP) 1992-10-06 US disclosed
EP-0452092-A2 6-Epithioethyl-3-oxatricyclo (3.2.1.02.4) octane and process for preparation thereof NIPPON OIL CO. LTD. (JP) 1991-10-16 EP disclosed
EP-0068590-B1 NOVEL UREA DERIVATIVES THE PROCTER & GAMBLE COMPANY (US) 1985-01-02 EP disclosed
US-4460602-A ANALGESICS, ANTIINFLAMMATORY AGENTS, DEPILATORIES THE PROCTER & GAMBLE COMPANY (US) 1984-07-17 US disclosed
EP-0068590-A1 Novel urea derivatives THE PROCTER & GAMBLE COMPANY (US) 1983-01-05 EP disclosed
US-4237217-A IN WHICH COUPLING POSITION IS SUBSTITUTED WITH A SULFONAMIDO GROUP FUJI PHOTO FILM CO., LTD. (JP) 1980-12-02 US disclosed
US-3991008-A METHACRYLATE MONOMER, HYDROPEROXIDE OXIDIZER, THIOUREA REDUCING AGENT THE KENDALL COMPANY (US) 1976-11-09 US disclosed