SCHEMBL4219082

SCHEMBL4219082

CC=C(C)C(=O)OCC(C)O

nearest known ligand 0.42

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.42
MAPT P10636 1/20 0.40
MAPK1 P28482 1/20 0.33
HSD17B10 Q99714 1/20 0.32
DHCR24 Q15392 1/20 0.31
CYP2D6 P10635 1/20 0.31
CYP2C19 P33261 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8853633 1.00 TSHR (0.42) TSHRMAPTMAPK1HSD17B10DHCR24
SCHEMBL15169736 0.85 TDP1 (0.41) TSHRMAPT
SCHEMBL9063931 0.85 TSHR (0.41) TSHRMAPTMAPK1HSD17B10CYP2D6
SCHEMBL1178580 0.85 TSHR (0.41) TSHRDHCR24CYP2D6CYP2C19
SCHEMBL873047 0.84 TSHR (0.59) TSHRMAPTDHCR24CYP2D6CYP2C19
SCHEMBL873046 0.84 TSHR (0.59) TSHRMAPTDHCR24CYP2D6CYP2C19
SCHEMBL1473218 0.84 TSHR (0.59) TSHRMAPTDHCR24CYP2D6CYP2C19
SCHEMBL6936275 0.84 TSHR (0.39) TSHRCYP2D6CYP2C19
SCHEMBL10649967 0.83 TSHR (0.39) TSHRDHCR24
SCHEMBL27755724 0.83 TSHR (0.39) TSHRMAPTMAPK1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 227 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117430812-B Photosensitive polyamic acid ester resin, resin composition and application 明士(北京)新材料开发有限公司 2024-03-19 CN claimed
CN-117430812-A Photosensitive polyamic acid ester resin, resin composition and application 明士(北京)新材料开发有限公司 2024-01-23 CN claimed
CN-109643785-A rechargeable battery unit DST创新有限公司 2019-04-16 CN claimed
CN-104769074-B Curable cross-linkable composition as loss circulation material 陶氏环球技术有限责任公司 2017-11-28 CN claimed
CN-105885311-A Impact-resistant flame retardant plastic material and preparing method thereof 苏州锦腾电子科技有限公司 2016-08-24 CN claimed
CN-102272679-B Method of controlling surface roughness of a flexographic printing plate MACDERMID PRINTING SOLUTIONS 2013-08-14 CN claimed
CN-1908816-B Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material JSR CORP 2012-09-05 CN claimed
CN-102272679-A Method of controlling surface roughness of a flexographic printing plate 2011-12-07 CN claimed
CN-101403457-B High-water absorption resin piping detection leak-blocking device, preparation method and application thereof QI SHEN 2010-04-21 CN claimed
CN-101534870-A Hydrogel wound dressing and biomaterials formed in situ and their uses ULURU INC (US) 2009-09-16 CN claimed
CN-1079958-C Stable ionomer photoresist emulsion, method of making and use thereof GRACE W R & CO (US) 2002-02-27 CN claimed
US-5703188-A Process for removing bile salts from a patient and compositions therefor GELTEX PHARMACEUTICALS, INC. (US) 1997-12-30 US claimed
CN-1143418-A Stable ionomeric photoresist emulsion and process of preparation and use thereof GRACE W R & CO (US) 1997-02-19 CN claimed
CN-1030739-C Method for selectively coating metal surface, method for forming circuit pattern from metal surface and photosensitive emulsion used therefor GRACE W R & CO (US) 1996-01-17 CN claimed
CN-1054836-A Automatic deposition emulsion and the method for the metal surface being carried out selective protection with this emulsion GRACE W R & CO (US) 1991-09-25 CN claimed
CN-1010713-B CONJUGATED DIENE COPOLYMER, A PROCESS FOR PRODUCING THE COPOLYMER, AND A PHOTOSENSITIVE COMPSITION COMPRISING THE COPOLYMER JAPAN SYNTHETIC RUBBER CO LTD (JP) 1990-12-05 CN claimed
EP-0150674-B1 METHOD OF MAKING THERMOSETTABLE BONDING FILMS CIBA-GEIGY AG (CH) 1987-04-01 EP claimed
US-4612209-A PHOTOPOLYMERIZABLE ACRYLIC ACIDS OR ESTERS AND EPOXYIDE RESIN CIBA-GEIGY CORPORATION (US) 1986-09-16 US claimed
US-4425179-A ACTIVATORS, ACRYLIC AND METHACRYLIC ESTERS USM CORPORATION (US) 1984-01-10 US claimed
US-4395301-A URING AZINE DYE MATERIAL, CURING ETHYLENICALLY UNSATURATED MONOMERS AT ROOM TEMPERATURE USM CORPORATION (US) 1983-07-26 US claimed