SCHEMBL42198

SCHEMBL42198

F[Si](F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28207647 1.00
SCHEMBL3861056 0.89
SCHEMBL10388078 0.89
SCHEMBL31387424 0.89
SCHEMBL20768009 0.89
SCHEMBL21058052 0.89
Helium SCHEMBL3859739 0.89
Hydrochloric Acid SCHEMBL10797371 0.89
Fluoride SCHEMBL7699537 0.89
SCHEMBL31229856 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 25570 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260145984-A1 EXPANDING TIP PLUGS AND METHOD OF USING AND MAKING THE SAME CORNING INCORPORATED (US) 2026-05-28 US claimed
US-20260148985-A1 FLUIDIZED LARGE-SCALE PREPARATION METHOD FOR SILICON-CARBON NEGATIVE ELECTRODE MATERIAL Suzhou Newmat Nanotechnology Co., Ltd. (CN) 2026-05-28 US claimed
EP-4748968-A1 METHOD FOR FORMING THIN FILM USING TWO TYPES OF SILICON PRECURSOR COMPOUNDS Hansol Chemical Co., Ltd (KR) 2026-05-27 EP claimed
CN-118045400-B Sulfuric acid defluorination system and defluorination process Chizhou Tianci high tech materials Co.,Ltd. (CN) 2026-05-26 CN claimed
CN-122083068-A Carbon fiber hydrostatic bearing with micro-nano structure oleophobic supporting surface 2026-05-26 CN claimed
US-20260142141-A1 LITHIUM METAL ELECTRODES SION POWER CORPORATION (US) 2026-05-21 US claimed
CN-120809792-B Green low-energy-consumption low-expansion silicon-carbon negative electrode and preparation method and application thereof 湖南智电谷新能源技术研究院有限公司 2026-05-19 CN claimed
US-12635431-B2 High aspect ratio carbon layer etch with improved throughput and process window TOKYO ELECTRON LIMITED (JP) 2026-05-19 US claimed
US-12635436-B2 Plasma processing method and plasma processing system TOKYO ELECTRON LIMITED (JP) 2026-05-19 US claimed
CN-122035793-A Preparation method of phosphorite defluorination and low-electricity-consumption yellow phosphorus 成都市磷缘素科技发展有限责任公司 2026-05-15 CN claimed
US-4036938-A BY FLAME HYDROLYSIS REED RICHARD S 1977-07-19 US claimed
US-4009214-A CONTACTING WITH CALCIUM CHLORIDE ON ACTIVATED ALUMINA THE LUMMUS COMPANY (US) 1977-02-22 US claimed
US-3997652-A OF HYDROGEN FLUORIDE, SODIUM FLUORIDE ABSORBENT TELLER ENVIRONMENTAL SYSTEMS, INC. (US) 1976-12-14 US claimed
US-3983012-A Epitaxial growth of silicon or germanium by electrodeposition from molten salts THE BOARD OF TRUSTEES OF LELAND STANFORD JUNIOR UNIVERSITY (US) 1976-09-28 US claimed
US-3971845-A Recovery of hydrofluoric acid from aqueous fluosilicic acid BAYER AKTIENGESELLSCHAFT (DT) 1976-07-27 US claimed
US-3969485-A Process for converting silicon-and-fluorine-containing waste gases into silicon dioxide and hydrogen fluoride FLEMMERT GOESTA LENNART 1976-07-13 US claimed
US-3969482-A Abatement of high concentrations of acid gas emissions TELLER ENVIRONMENTAL SYSTEMS, INC. (US) 1976-07-13 US claimed
US-3969163-A Vapor deposition method of forming low cost semiconductor solar cells including reconstitution of the reacted gases TEXAS INSTRUMENTS INCORPORATED (US) 1976-07-13 US claimed
US-3966877-A Method of processing of waste gases KALACH VLADIMIR SERGEEVICH 1976-06-29 US claimed
US-3956147-A Production of metal fluorides from fluosilicic acid BAYER AKTIENGESELLSCHAFT (DT) 1976-05-11 US claimed