SCHEMBL4226902

SCHEMBL4226902

COC1(CCCS)CCC[Si](OC)(OC)O1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16343901 0.82
SCHEMBL9870464 0.79
SCHEMBL28496826 0.78
SCHEMBL6390904 0.75
SCHEMBL11190864 0.74
SCHEMBL6766431 0.71
SCHEMBL1092187 0.66
SCHEMBL1908362 0.65
SCHEMBL3474686 0.64
SCHEMBL4827744 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113248794-B Nano steel slag modified halogen-free flame retardant, halogen-free flame retardant polyurethane foam and preparation method 安徽工业大学 2022-08-23 CN claimed
CN-115558110-B Polymer and preparation method thereof, gel and dielectric material 宁夏清研高分子新材料有限公司 2023-07-21 CN disclosed
CN-116230293-A Flexible electrode, preparation method and application thereof, and sensor 南方科技大学 2023-06-06 CN disclosed
CN-115558110-A Polymer, preparation method thereof, gel and dielectric material 宁夏清研高分子新材料有限公司 2023-01-03 CN disclosed
CN-113248794-B Nano steel slag modified halogen-free flame retardant, halogen-free flame retardant polyurethane foam and preparation method 安徽工业大学 2022-08-23 CN disclosed
CN-113248794-A Nano steel slag modified halogen-free flame retardant, halogen-free flame retardant polyurethane foam and preparation method 安徽工业大学 2021-08-13 CN disclosed
US-7597950-B1 Nanoparticles having sub-nanometer features MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2009-10-06 US disclosed
US-20090246527-A1 NANOPARTICLES HAVING SUB-NANOMETER FEATURES MASSACHUSETTS INSTITUTE OF TECHNOLOGY 2009-10-01 US disclosed
WO-2007100787-A9 NANOPARTICLES HAVING SUB-NANOMETER FEATURES MASSACHUSETTS INST TECHNOLOGY (US) 2007-11-22 WO disclosed
WO-2007100787-A2 NANOPARTICLES HAVING SUB-NANOMETER FEATURES MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) 2007-09-07 WO disclosed
EP-0857770-B1 Coating compositions, hydrophilic films, and hydrophilic film-coated articles SHINETSU CHEMICAL CO (JP) 2004-09-22 EP disclosed
US-6048910-A AQUEOUS EMULSIONS OF SILICONES, RADICAL-POLYMERIZABLE UNSATURATED MONOMERS(IN CONTROLLED RATIOS) AND PHOTOCATALYST PARTICLES, FOR EXTERIOR BUILDING PAINTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-04-11 US disclosed
EP-0857770-A2 Coating compositions, hydrophilic films, and hydrophilic film-coated articles SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-08-12 EP disclosed
EP-0332321-B1 Fluorine-containing polymers with pendent thioorgano groups MINNESOTA MINING & MFG (US) 1995-04-12 EP disclosed
EP-0325210-B1 RELEASE AGENT AND COMPOSITE MATERIAL HAVING CURED RELEASE AGENT LAYER NITTO DENKO CORPORATION (JP) 1993-04-07 EP disclosed
US-4956419-A MONOTHIOORGANIC GROUPS GRAFTED TO FLUOROPOLYMERS TO MODIFY THE CURING PROPERTIES MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1990-09-11 US disclosed
US-4935458-A Release agent and composite material having cured release agent layer NITTO DENKO CORPORATION (JP) 1990-06-19 US disclosed
US-4894410-A CURABLE COATINGS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1990-01-16 US disclosed
EP-0332321-A2 Fluorine-containing polymers with pendent thioorgano groups MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1989-09-13 EP disclosed