⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21485086 | 0.72 | — | — | |
| SCHEMBL28113700 | 0.72 | — | — | |
| SCHEMBL4230924 | 0.70 | — | — | |
| SCHEMBL410636 | 0.69 | — | — | |
| SCHEMBL19492027 | 0.69 | TSHR (0.32) | — | |
| SCHEMBL20084448 | 0.69 | TSHR (0.32) | — | |
| SCHEMBL7012276 | 0.67 | — | — | |
| SCHEMBL592132 | 0.67 | — | — | |
| SCHEMBL1164858 | 0.67 | — | — | |
| SCHEMBL4236048 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11905491-B2 | Post CMP cleaning compositions | ENTEGRIS, INC. (US) | 2024-02-20 | — | — | US | claimed |
| EP-4225882-A1 | POST CMP CLEANING COMPOSITIONS | Entegris, Inc. (US) | 2023-08-16 | — | — | EP | claimed |
| WO-2018191424-A1 | POST CHEMICAL MECHANICAL POLISHING FORMULATIONS AND METHOD OF USE | ENTEGRIS, INC. (US) | 2018-10-18 | — | — | WO | claimed |
| US-20180291309-A1 | POST CHEMICAL MECHANICAL POLISHING FORMULATIONS AND METHOD OF USE | TRUIST BANK, AS NOTES COLLATERAL AGENT | 2018-10-11 | — | — | US | claimed |
| EP-4634965-A1 | SOLUTION FOR POST ETCH RESIDUE REMOVAL (PERR) | BASF SE (DE) | 2025-10-22 | — | — | EP | disclosed |
| EP-4634963-A1 | SOLUTION FOR POST ETCH RESIDUE REMOVAL (PERR) | BASF SE (DE) | 2025-10-22 | — | — | EP | disclosed |
| EP-4634964-A1 | SOLUTION FOR POST ETCH RESIDUE REMOVAL (PERR) | BASF SE (DE) | 2025-10-22 | — | — | EP | disclosed |
| EP-3824059-B1 | CLEANING COMPOSITION WITH CORROSION INHIBITOR | ENTEGRIS INC (US) | 2025-09-17 | — | — | EP | disclosed |
| WO-2025063732-A1 | CARBON NANOTUBE DISPERSION SOLUTION, PREPARATION METHOD THEREFOR, ELECTRODE SLURRY COMPOSITION COMPRISING SAME, ELECTRODE COMPRISING SAME, AND SECONDARY BATTERY COMPRISING SAME | 주식회사 베터리얼 | 2025-03-27 | — | — | WO | disclosed |
| WO-2025009754-A1 | CARBON NANOTUBE DISPERSION SOLUTION, PREPARATION METHOD THEREFOR, ELECTRODE SLURRY COMPOSITION COMPRISING SAME, ELECTRODE COMPRISING SAME, AND SECONDARY BATTERY COMPRISING SAME | 주식회사 베터리얼 | 2025-01-09 | — | — | WO | disclosed |
| WO-2024126549-A1 | SOLUTION FOR POST ETCH RESIDUE REMOVAL (PERR) | BASF SE (DE) | 2024-06-20 | — | — | WO | disclosed |
| WO-2024126588-A1 | SOLUTION FOR POST ETCH RESIDUE REMOVAL (PERR) | BASF SE (DE) | 2024-06-20 | — | — | WO | disclosed |
| US-20180291309-A1 | POST CHEMICAL MECHANICAL POLISHING FORMULATIONS AND METHOD OF USE | TRUIST BANK, AS NOTES COLLATERAL AGENT | 2018-10-11 | — | — | US | disclosed |
| EP-2814576-B1 | POLYCATIONIC POLYHYDROXYL COMPOUNDS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2017-11-15 | — | — | EP | disclosed |
| US-20150065579-A1 | POLYCATIONIC POLYHYDROXYL COMPOUNDS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2015-03-05 | — | — | US | disclosed |
| EP-2814576-A1 | POLYCATIONIC POLYHYDROXYL COMPOUNDS | Dow Global Technologies LLC (US) | 2014-12-24 | — | — | EP | disclosed |
| WO-2013148613-A1 | POLYCATIONIC POLYHYDROXYL COMPOUNDS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2013-10-03 | — | — | WO | disclosed |
| US-7595411-B2 | Phospholipid-analogous compounds | MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN E.V. (DE) | 2009-09-29 | — | — | US | disclosed |
| US-20050165245-A1 | Phospholipid-analogous compounds | MAX-PLANCK-GESELLSCHAFT ZUR FORDERUNG DER WISSENSCHAFTEN E.V. (DE) | 2005-07-28 | — | — | US | disclosed |
| US-6344576-B1 | CATIONIC PHOSPHATIDES AND GLYCERIDES | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. (DE) | 2002-02-05 | — | — | US | disclosed |