SCHEMBL424079

SCHEMBL424079

CC1=CC=CC(C)(Cl)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL283272 0.76
SCHEMBL2958342 0.75
SCHEMBL428475 0.74
SCHEMBL4588575 0.74
Hydrochloric Acid SCHEMBL11412157 0.73
SCHEMBL13862441 0.71
SCHEMBL31229282 0.71
SCHEMBL22288164 0.71
SCHEMBL7649545 0.71
SCHEMBL11792343 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9238608-B2 Spray process for selective oxidation UNIVERSITY OF KANSAS (US) 2016-01-19 US claimed
CN-102405207-A Spray process for selective oxidation UNIV KANSAS 2012-04-04 CN claimed
US-20120022287-A1 Spray Process for Selective Oxidation NATIONAL SCIENCE FOUNDATION 2012-01-26 US claimed
US-12325775-B2 Method for producing polyphenol derivative, polyphenol derivative, and polyphenol derivative-containing resin composition material IDEMITSU KOSAN CO., LTD. (JP) 2025-06-10 US disclosed
CN-113396171-B Process for producing polyphenol derivative, and resin composition containing polyphenol derivative 出光兴产株式会社 2025-03-28 CN disclosed
US-20220119575-A1 METHOD FOR PRODUCING POLYPHENOL DERIVATIVE, POLYPHENOL DERIVATIVE, AND POLYPHENOL DERIVATIVE-CONTAINING RESIN COMPOSITION MATERIAL IDEMITSU KOSAN CO.,LTD. (JP) 2022-04-21 US disclosed
EP-3922654-A1 METHOD FOR PRODUCING POLYPHENOL DERIVATIVE, POLYPHENOL DERIVATIVE, AND POLYPHENOL DERIVATIVE-CONTAINING RESIN COMPOSITION MATERIAL Idemitsu Kosan Co., Ltd. (JP) 2021-12-15 EP disclosed
CN-113396171-A Method for producing polyphenol derivative, and resin composition material containing polyphenol derivative 出光兴产株式会社 2021-09-14 CN disclosed
WO-2020162621-A1 METHOD FOR PRODUCING POLYPHENOL DERIVATIVE, POLYPHENOL DERIVATIVE, AND POLYPHENOL DERIVATIVE-CONTAINING RESIN COMPOSITION MATERIAL 出光興産株式会社 2020-08-13 WO disclosed
EP-2411357-B1 SPRAY PROCESS FOR SELECTIVE OXIDATION UNIV KANSAS (US) 2018-04-25 EP disclosed
US-9238608-B2 Spray process for selective oxidation UNIVERSITY OF KANSAS (US) 2016-01-19 US disclosed
CN-102405207-A Spray process for selective oxidation UNIV KANSAS 2012-04-04 CN disclosed
WO-2012020220-A1 COMPOUNDS NOVACTA BIOSYSTEMS LIMITED (GB) 2012-02-16 WO disclosed
US-20120022287-A1 Spray Process for Selective Oxidation NATIONAL SCIENCE FOUNDATION 2012-01-26 US disclosed
WO-2002014246-A1 METHOD FOR NUCLEAR CHLORINATION OF META-XYLOL BAYER AKTIENGESELLSCHAFT (DE) 2002-02-21 WO disclosed