SCHEMBL4243242

SCHEMBL4243242

CC(C)C1=C([Er](C2=C(C(C)C)C=CC2)C2=C(C(C)C)C=CC2)CC=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9750913 0.71
SCHEMBL714797 0.70
SCHEMBL7923511 0.70
SCHEMBL10390244 0.68
SCHEMBL9224200 0.68
SCHEMBL8374668 0.68
SCHEMBL10390027 0.68
Hydrochloric Acid SCHEMBL7918834 0.68
SCHEMBL2426984 0.68
SCHEMBL10390106 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070012907-A1 Doped Semiconductor Nanocrystal Layers And Preparation Thereof GROUP IV SEMICONDUCTOR INC. 2007-01-18 US claimed
EP-1588423-A2 RARE EARTH DOPED GROUP IV NANOCRYSTAL LAYERS Group IV Semiconductor Inc. (CA) 2005-10-26 EP claimed
US-20040214362-A1 Doped semiconductor nanocrystal layers and preparation thereof MCMASTER UNIVERSITY (CA) 2004-10-28 US claimed
US-20040149353-A1 Doped semiconductor powder and preparation thereof KIRSTEEN MGMT. GROUP LLC 2004-08-05 US claimed
WO-2004066345-A2 DOPED SEMICONDUCTOR NANOCRYSTAL LAYERS AND PREPARATION THEREOF GROUP IV SEMICONDUCTOR INC. (CA) 2004-08-05 WO claimed
WO-2004066346-A2 RARE EARTH DOPED GROUP IV NANOCRYSTAL LAYERS GROUP IV SEMICONDUCTOR INC. (CA) 2004-08-05 WO claimed
CN-1117389-C Semiconductor layer mixed with chemical vapor deposited rare-earth IBM (US) 2003-08-06 CN claimed
CN-1255735-A Semiconductor layer mixed with chemical vapor deposited rare-earth IBM (US) 2000-06-07 CN claimed
EP-0586321-B1 Formation of supersaturated rare earth doped semiconductor layers by CVD IBM (US) 1998-05-20 EP claimed
US-5322813-A Method of making supersaturated rare earth doped semiconductor layers by chemical vapor deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-06-21 US claimed
EP-0586321-A2 Supersaturated rare earth doped semiconductor layers by CVD INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-03-09 EP claimed
CN-119920681-A Method, apparatus and structure for forming rare earth-containing layers ASM IP私人控股有限公司 2025-05-02 CN disclosed
US-20250137127-A1 METHOD FOR FORMING A RARE-EARTH-CONTAINING LAYER, APPARATUS, AND STRUCTURE ASM IP HOLDING B.V. (NL) 2025-05-01 US disclosed
US-20160300921-A1 SEMICONDUCTOR ELEMENT, METHOD FOR FABRICATING THE SAME, AND SEMICONDUCTOR DEVICE INCLUDING THE SAME KOREA ADVANCED INSTUTE OF SCIENCE AND TECHNOLOGY (KR) 2016-10-13 US disclosed
US-9450064-B1 Semiconductor element, method for fabricating the same, and semiconductor device including the same SK Hynix Inc. (KR) 2016-09-20 US disclosed
EP-0586321-B1 Formation of supersaturated rare earth doped semiconductor layers by CVD IBM (US) 1998-05-20 EP disclosed
US-5646425-A Supersaturated rare earth doped semiconductor layers by chemical vapor deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1997-07-08 US disclosed
US-5534079-A Supersaturated rare earth doped semiconductor layers formed by chemical vapor deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1996-07-09 US disclosed
US-5322813-A Method of making supersaturated rare earth doped semiconductor layers by chemical vapor deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-06-21 US disclosed
EP-0586321-A2 Supersaturated rare earth doped semiconductor layers by CVD INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1994-03-09 EP disclosed