⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL450073 | 0.96 | — | — | |
| SCHEMBL27428604 | 0.81 | — | — | |
| SCHEMBL284681 | 0.79 | — | — | |
| SCHEMBL16672175 | 0.79 | — | — | |
| SCHEMBL15599702 | 0.79 | — | — | |
| Hydrochloric Acid SCHEMBL28112622 | 0.75 | KDM4E (0.53) | — | |
| Hydrochloric Acid SCHEMBL10804922 | 0.75 | KDM4E (0.53) | — | |
| SCHEMBL9066384 | 0.74 | CA12 (0.48) | — | |
| SCHEMBL5667451 | 0.74 | CA12 (0.48) | — | |
| SCHEMBL5701081 | 0.74 | CA12 (0.48) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118255685-A | Tricyclic compound, pharmaceutical composition and application thereof | 珂阑(上海)医药科技有限公司 | 2024-06-28 | — | — | CN | disclosed |
| CN-103649248-B | The aqueous glass coating composition that free radical is curable | 拜尔材料科学有限公司 | 2016-06-22 | — | — | CN | disclosed |
| CN-102781626-B | Polishing pad | TOYO TIRE & RUBBER CO.,LTD. (JP) | 2016-01-20 | — | — | CN | disclosed |
| CN-103180100-B | Grinding pad and manufacture method thereof | TOYO TIRE & RUBBER CO.,LTD. (JP) | 2016-01-13 | — | — | CN | disclosed |
| CN-105008092-A | METHOD FOR PRODUCING POLISHING PAD | TOYO TIRE & RUBBER CO | 2015-10-28 | — | — | CN | disclosed |
| CN-103153539-B | Grinding pad and manufacture method thereof | TOYO TIRE & RUBBER CO.,LTD. (JP) | 2015-09-09 | — | — | CN | disclosed |
| CN-104755228-A | Polishing pad production method | TOYO TIRE & RUBBER CO | 2015-07-01 | — | — | CN | disclosed |
| CN-104755227-A | Multilayer polishing pad | TOYO TIRE & RUBBER CO | 2015-07-01 | — | — | CN | disclosed |
| CN-104736297-A | Method for producing layered polishing pads | TOYO TIRE & RUBBER CO | 2015-06-24 | — | — | CN | disclosed |
| CN-104703756-A | Polishing pad and method for manufacturing the same | TOYO TIRE & RUBBER CO | 2015-06-10 | — | — | CN | disclosed |
| US-20070149704-A1 | Radiation curable polyurethane dispersions | REICHHOLD, INC. | 2007-06-28 | — | — | US | disclosed |
| WO-2006138557-A2 | RADIATION CURABLE POLYURETHANE DISPERSIONS | REICHHOLD, INC. (US) | 2006-12-28 | — | — | WO | disclosed |
| US-6830864-B2 | Method for transferring transparent conductive film | KYODO PRINTING CO., LTD. (JP) | 2004-12-14 | — | — | US | disclosed |
| US-6413693-B1 | Method for transferring transparent conductive film | KYODO PRINTING CO., LTD. (JP) | 2002-07-02 | — | — | US | disclosed |
| US-20020055057-A1 | Method for transferring transparent conductive film | BEKKU ICHIRO (JP) | 2002-05-09 | — | — | US | disclosed |
| EP-1046945-A2 | Method for transferring transparent conductive film | Kyodo Printing Co., Ltd. (JP) | 2000-10-25 | — | — | EP | disclosed |
| US-5478918-A | Low stress polyimide composition and precursor composition solution of same | CENTRAL GLASS COMPANY, LIMITED (JP) | 1995-12-26 | — | — | US | disclosed |
| EP-0559911-A1 | ANTITHROMBOTIC RESIN, TUBE, FILM AND COATING | OTSUKA PHARMACEUTICAL FACTORY, INC. (JP) | 1993-09-15 | — | — | EP | disclosed |
| EP-0231953-A2 | Light-absorbing resins for display device, display devices using the resin and method of manufacturing the same | KABUSHIKI KAISHA TOSHIBA (JP) | 1987-08-12 | — | — | EP | disclosed |
| US-4411735-A | Polymeric insulation layer etching process and composition | NATIONAL SEMICONDUCTOR CORPORATION (US) | 1983-10-25 | — | — | US | disclosed |