SCHEMBL4246781

SCHEMBL4246781

CCCOP(=O)(CC)CCC

nearest known ligand 0.38

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
CYP3A4 P08684 2/20 0.37
TSHR P16473 3/20 0.35
PPARD Q03181 2/20 0.33
LPAR3 Q9UBY5 3/20 0.32
LPAR1 Q92633 2/20 0.32
LPAR2 Q9HBW0 2/20 0.32
HPGD P15428 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL575794 0.90 CYP3A4 (0.40) MEN1KMT2ACYP3A4TSHRPPARD
SCHEMBL575364 0.87 CYP3A4 (0.42) MEN1KMT2ACYP3A4TSHRPPARD
SCHEMBL5485187 0.86 CYP3A4 (0.56) CYP3A4TSHRLPAR3LPAR1LPAR2
SCHEMBL5491053 0.86 CYP3A4 (0.44) MEN1KMT2ACYP3A4TSHRLPAR3
SCHEMBL2487586 0.84 PPARD (0.43) MEN1KMT2ACYP3A4TSHRPPARD
SCHEMBL28225458 0.82 LPAR3 (0.45) CYP3A4LPAR3LPAR1LPAR2
SCHEMBL5484510 0.82 TSHR (0.48) CYP3A4TSHRPPARD
SCHEMBL5490393 0.81 CYP3A4 (0.42) MEN1KMT2ACYP3A4TSHRPPARD
SCHEMBL5486906 0.81 CYP3A4 (0.44) MEN1KMT2ACYP3A4TSHRLPAR3
SCHEMBL11594311 0.79 PPARD (0.48) MEN1KMT2ACYP3A4PPARDLPAR3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025060129-A1 AMMONIUM DIHYDROCARBYLPHOSPHINATE AND PREPARATION METHOD THEREFOR AND USE THEREOF 江苏利思德新材料股份有限公司 2025-03-27 WO claimed
CN-117263974-A Dialkyl phosphinic acid ammonium salt and preparation method and application thereof 江苏利思德新材料股份有限公司 2023-12-22 CN claimed
CN-119751500-A Phosphorus-nitrogen-containing synergistic ionic liquid flame retardant, and preparation method and application thereof 福建新安科技有限责任公司 2025-04-04 CN disclosed
WO-2025060129-A1 AMMONIUM DIHYDROCARBYLPHOSPHINATE AND PREPARATION METHOD THEREFOR AND USE THEREOF 江苏利思德新材料股份有限公司 2025-03-27 WO disclosed
CN-117263974-A Dialkyl phosphinic acid ammonium salt and preparation method and application thereof 江苏利思德新材料股份有限公司 2023-12-22 CN disclosed
CN-108291157-A Selective hydrogenation using flow index 切弗朗菲利浦化学公司 2018-07-17 CN disclosed
CN-107107049-A Selective hydrogenation catalyst and its preparation and application 切弗朗菲利浦化学公司 2017-08-29 CN disclosed
CN-102341175-B Selective hydrogenation catalyst and preparation and application thereof Chevron Phillips Chemical Co.,L.P. (US) 2016-11-30 CN disclosed
EP-1876193-B1 PROCESS FOR PRODUCING POLYOXYMETHYLENE COPOLYMER MITSUBISHI GAS CHEMICAL CO (JP) 2013-12-25 EP disclosed
CN-102341175-A Selective hydrogenation catalyst and methods of making and using same CHEVRON PHILLIPS CHEMICAL CO 2012-02-01 CN disclosed
US-7897672-B2 Process for producing polyoxymethylene copolymer MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-03-01 US disclosed
US-20090062503-A1 Process for Producing Polyoxymethylene Copolymer MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2009-03-05 US disclosed
EP-1876193-A1 PROCESS FOR PRODUCING POLYOXYMETHYLENE COPOLYMER MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-01-09 EP disclosed
US-20070087270-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE SOLUTION SECONDARY BATTERY EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2007-04-19 US disclosed
US-7169511-B2 Nonaqueous electrolyte solution and nonaqueous electrolyte solution secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2007-01-30 US disclosed
EP-1555711-A1 NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY CONTAINING THE SAME Mitsubishi Chemical Corporation (JP) 2005-07-20 EP disclosed
US-20050014071-A1 Nonaqueous electrolyte solution and nonaqueous electrolyte solution secondary battery employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2005-01-20 US disclosed