SCHEMBL4257933

SCHEMBL4257933

O=C(CS)c1ccc2ccccc2c1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PTPN1 P18031 1/20 0.67
▸ CES2 O00748 1/20 0.61
▸ CES1 P23141 1/20 0.61
▸ KDM4E B2RXH2 4/20 0.61
▸ HPGD P15428 4/20 0.61
▸ SMN1; SMN2 Q16637 3/20 0.61
▸ ALDH1A1 P00352 3/20 0.57
▸ NPC1 O15118 2/20 0.57
▸ RAB9A P51151 1/20 0.57
▸ MAPT P10636 3/20 0.53
▸ KMT2A Q03164 3/20 0.53
▸ MEN1 O00255 2/20 0.53
▸ POLB P06746 2/20 0.53
▸ L3MBTL1 Q9Y468 1/20 0.53
▸ HDAC1 Q13547 4/20 0.53
▸ HDAC8 Q9BY41 3/20 0.53
▸ EGFR P00533 1/20 0.52
▸ TP53 P04637 1/20 0.52
▸ CYP3A4 P08684 1/20 0.52
▸ PKM P14618 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1974978 0.83 PTPN1 (0.71) PTPN1CES2CES1KDM4EHPGD
SCHEMBL29489791 0.83 PTPN1 (0.71) PTPN1CES2CES1KDM4EHPGD
SCHEMBL30375368 0.82 PTPN1 (0.69) PTPN1CES2CES1KDM4EHPGD
SCHEMBL1448153 0.82 PTPN1 (0.69) PTPN1CES2CES1KDM4EHPGD
SCHEMBL28345275 0.82 PTPN1 (0.69) PTPN1CES2CES1KDM4EHPGD
SCHEMBL13715355 0.80 PTPN1 (0.67) PTPN1CES2CES1KDM4EHPGD
SCHEMBL8766718 0.80 PTPN1 (0.67) PTPN1CES2CES1KDM4EHPGD
SCHEMBL14765363 0.80 PTPN1 (0.67) PTPN1CES2CES1KDM4EHPGD
SCHEMBL5899479 0.80 PTPN1 (0.67) PTPN1CES2CES1KDM4EHPGD
SCHEMBL444059 0.80 PTPN1 (0.67) PTPN1CES2CES1KDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110256655-A A kind of tannic acid Quito official's epoxy resin and preparation method thereof and preparation can liquid alkali developing negative photoresist 苏州瑞红电子化学品有限公司 2019-09-20 — — CN claimed
CN-105566552-B A kind of acrylate copolymer and its manufactured 248nm photoetching compositions 江南大学 2019-05-17 — — CN claimed
CN-108084331-A A kind of biology base film-forming resin and its photoresist of preparation 江南大学 2018-05-29 — — CN claimed
CN-107325218-A A kind of fluorostyrenic monomers, fluorinated copolymer and the application in 248nm deep ultraviolet light-sensitive lacquers 苏州瑞红电子化学品有限公司 2017-11-07 — — CN claimed
CN-105566552-A Acrylate copolymer and 248nm photoresist composition made thereof UNIV JIANGNAN 2016-05-11 — — CN claimed
CN-110256655-A A kind of tannic acid Quito official's epoxy resin and preparation method thereof and preparation can liquid alkali developing negative photoresist 苏州瑞红电子化学品有限公司 2019-09-20 — — CN disclosed
CN-108084331-B A kind of biology base film-forming resin and its photoresist of preparation 江南大学 2019-08-16 — — CN disclosed
CN-105566552-B A kind of acrylate copolymer and its manufactured 248nm photoetching compositions 江南大学 2019-05-17 — — CN disclosed
CN-108084331-A A kind of biology base film-forming resin and its photoresist of preparation 江南大学 2018-05-29 — — CN disclosed
CN-105566552-A Acrylate copolymer and 248nm photoresist composition made thereof UNIV JIANGNAN 2016-05-11 — — CN disclosed
CN-103119483-B Optical waveguide and electronic equipment SUMITOMO BAKELITE CO.,LTD. (JP) 2015-09-30 — — CN disclosed
CN-103080798-B Optical waveguide and electronic device SUMITOMO BAKELITE CO.,LTD. (JP) 2015-09-16 — — CN disclosed
CN-101638388-A Imide compound and chemically amplified resist composition containing the same SUMITOMO CHEMICAL CO JP 2010-02-03 — — CN disclosed
EP-2083293-A1 LIGHT GUIDE AND LIGHT GUIDE STRUCTURE Sumitomo Bakelite Company, Ltd. (JP) 2009-07-29 — — EP disclosed
WO-2006093518-A2 THIENYL COMPOUNDS FOR TREATING VIRUS-RELATED CONDITIONS APATH, LLC (US) 2006-09-08 — — WO disclosed
US-20050065118-A1 Organosulfur inhibitors of tyrosine phosphatases METABASIS THERAPEUTICS, INC. 2005-03-24 — — US disclosed
CN-1190706-C Chemical intensified positive photoresist composite SUMITOMO CHEMICAL CO (JP) 2005-02-23 — — CN disclosed
EP-1446110-A2 ORGANOSULFUR INHIBITORS OF TYROSINE PHOSPHATASES Structural Bioinformatics Inc. (US) 2004-08-18 — — EP disclosed
WO-2003032916-A2 ORGANOSULFUR INHIBITORS OF TYROSINE PHOSPHATASES STRUCTURAL BIOINFORMATICS INC. (US) 2003-04-24 — — WO disclosed
CN-1245910-A Chemical intensified positive photoresist composite SUMITOMO CHEMICAL CO (JP) 2000-03-01 — — CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050065118-A1 Organosulfur inhibitors of tyrosine phosphatases PTPRS, PTPRJ, PTPRCAP PTPN1 15/4885CES2 1903/4885CES1 2128/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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