⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7908838 | 1.00 | — | — | |
| SCHEMBL20097735 | 1.00 | — | — | |
| SCHEMBL7906063 | 1.00 | — | — | |
| SCHEMBL19118462 | 1.00 | — | — | |
| SCHEMBL13533913 | 0.84 | — | — | |
| SCHEMBL873222 | 0.84 | — | — | |
| SCHEMBL13537778 | 0.80 | — | — | |
| SCHEMBL7679321 | 0.76 | — | — | |
| SCHEMBL5954153 | 0.76 | — | — | |
| SCHEMBL24996793 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 195 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11835857-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11835857-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11829068-B2 | Resist composition, method of forming resist pattern, compound, and resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-11780946-B2 | Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-10 | — | — | US | disclosed |
| US-11762288-B2 | Resist composition, method of forming resist pattern, and acid diffusion-controlling agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| US-11754922-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| US-11754922-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| US-11747726-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-05 | — | — | US | disclosed |
| US-11709425-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |
| US-11709425-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |
| EP-1874845-A2 | METHOD FOR PRODUCING POLYHYDROXYALKANOATES | BASF AKTIENGESELLSCHAFT (DE) | 2008-01-09 | — | — | EP | disclosed |
| US-7241552-B2 | Resist composition comprising photosensitive polymer having lactone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-07-10 | — | — | US | disclosed |
| US-7145022-B2 | Catalyst for the carbonylation of oxiranes | BASF AKTIENGESELLSCHAFT (DE) | 2006-12-05 | — | — | US | disclosed |
| WO-2006108829-A2 | METHOD FOR PRODUCING POLYHYDROXYALKANOATES | BASF AKTIENGESELLSCHAFT (DE) | 2006-10-19 | — | — | WO | disclosed |
| WO-2006058681-A2 | METHOD FOR PRODUCING ENANTIOMER-ENRICHED LACTONES | BASF AKTIENGESELLSCHAFT (DE) | 2006-06-08 | — | — | WO | disclosed |
| US-20050240032-A1 | Catalyst for the carbonylation of oxiranes | BASF AKTIENGESELLSCHAFT (DE) | 2005-10-27 | — | — | US | disclosed |
| EP-0602515-B1 | Process for the preparation of 5-membered heterocycles | BASF AG (DE) | 1998-07-15 | — | — | EP | disclosed |
| US-5453516-A | Furanones, pyrrolidones | BASF AKTIENGESELLSCHAFT (DE) | 1995-09-26 | — | — | US | disclosed |
| US-5401857-A | Process for making γ-butyrolactones | ARCO CHEMICAL TECHNOLOGY, L.P. (US) | 1995-03-28 | — | — | US | disclosed |
| EP-0602515-A1 | Process for the preparation of 5-membered heterocycles | BASF Aktiengesellschaft (DE) | 1994-06-22 | — | — | EP | disclosed |