Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2400129 | 1.00 | TSHR (0.37) | TSHRCYP3A4HSD17B10MEN1THRB | |
| SCHEMBL28639640 | 1.00 | TSHR (0.37) | TSHRCYP3A4HSD17B10MEN1THRB | |
| SCHEMBL431426 | 0.97 | — | — | |
| SCHEMBL4397632 | 0.88 | HTT (0.41) | TSHRCYP3A4HSD17B10MEN1THRB | |
| SCHEMBL4398847 | 0.88 | TSHR (0.40) | TSHRCYP3A4HSD17B10MEN1THRB | |
| SCHEMBL4393750 | 0.85 | — | — | |
| SCHEMBL17586846 | 0.83 | HSD17B10 (0.45) | TSHRCYP3A4HSD17B10MEN1THRB | |
| SCHEMBL272664 | 0.83 | HSD17B10 (0.45) | TSHRCYP3A4HSD17B10MEN1THRB | |
| SCHEMBL7799602 | 0.83 | HSD17B10 (0.45) | TSHRCYP3A4HSD17B10MEN1THRB | |
| SCHEMBL116376 | 0.83 | HSD17B10 (0.45) | TSHRCYP3A4HSD17B10MEN1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115586701-A | Photosensitive composition | 东京应化工业株式会社 | 2023-01-10 | — | — | CN | disclosed |
| CN-115509087-A | Photosensitive composition | 东京应化工业株式会社 | 2022-12-23 | — | — | CN | disclosed |
| CN-115343913-A | Photosensitive resin, negative photosensitive resin composition, method for producing patterned cured film, and carboxyl group-containing resin | 东京应化工业株式会社 | 2022-11-15 | — | — | CN | disclosed |
| CN-107817649-B | Photosensitive resin composition, polyamide resin and method for producing same, compound and method for producing same, cured film and method for producing same | 东京应化工业株式会社 | 2022-09-16 | — | — | CN | disclosed |
| CN-108121158-B | Photosensitive composition, cured film, light-emitting layer for light-emitting display element, and method for forming light-emitting layer | 东京应化工业株式会社 | 2022-07-22 | — | — | CN | disclosed |
| CN-114761498-A | Photosensitive ink composition, cured product, display panel, and method for producing cured product | 东京应化工业株式会社 | 2022-07-15 | — | — | CN | disclosed |
| CN-114761497-A | Photosensitive ink composition, cured product, display panel, and method for producing cured product | 东京应化工业株式会社 | 2022-07-15 | — | — | CN | disclosed |
| CN-114761875-A | Photosensitive composition, cured product, and method for producing cured product | 东京应化工业株式会社 | 2022-07-15 | — | — | CN | disclosed |
| CN-114746808-A | Photosensitive composition, cured product, and method for producing cured product | 东京应化工业株式会社 | 2022-07-12 | — | — | CN | disclosed |
| CN-107315318-B | Photosensitive composition | 东京应化工业株式会社 | 2022-07-01 | — | — | CN | disclosed |
| CN-106292205-B | Pattern forming method | 东京应化工业株式会社 | 2020-12-18 | — | — | CN | disclosed |
| CN-107129665-B | Curable resin composition | 东京应化工业株式会社 | 2020-11-24 | — | — | CN | disclosed |
| CN-107429059-B | Energy-sensitive resin composition | 东京应化工业株式会社 | 2020-10-23 | — | — | CN | disclosed |
| CN-111240156-A | Photosensitive resin composition, method for producing patterned cured film, and patterned cured film | 东京应化工业株式会社 | 2020-06-05 | — | — | CN | disclosed |
| CN-111205648-A | Curable composition, cured product, microlens, and optical element | 东京应化工业株式会社 | 2020-05-29 | — | — | CN | disclosed |
| CN-104635423-B | Photosensitive resin composition for forming black columnar spacer | 东京应化工业株式会社 | 2020-05-12 | — | — | CN | disclosed |
| CN-106256837-B | Curable composition, method for producing cured product, and hard coating material | 东京应化工业株式会社 | 2020-04-10 | — | — | CN | disclosed |
| CN-110955114-A | Photosensitive resin composition, method for producing patterned cured film, and cured film | 东京应化工业株式会社 | 2020-04-03 | — | — | CN | disclosed |
| US-7605263-B2 | Fluorescent naphthalene-1,4,5,8-tetracarboxylic bisimides with an electron-donating substituent on the nucleus | INFINEON TECHNOLOGIES AG (DE) | 2009-10-20 | — | — | US | disclosed |
| US-20030153005-A1 | Fluorescent naphthalene -1,4,5,8-tetracarboxylic bisimides with an electron-donating substituent on the nucleus | POLARIS INNOVATIONS LIMITED (IE) | 2003-08-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030153005-A1 | Fluorescent naphthalene -1,4,5,8-tetracarboxylic bisimides with an electron-donating substituent on the nucleus | H1-4, H1-3, H1-5 | TSHR 115/4885CYP3A4 1720/4885HSD17B10 2358/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.