SCHEMBL4277510

SCHEMBL4277510

CC1(C)C2CC(O)C1(C)C2

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
CYP19A1 P11511 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methane SCHEMBL29217997 0.79 GAA (0.30) GAAL3MBTL1
Dexborneol SCHEMBL3507513 0.77 EPHX2 (0.41) GAA
(-)-Borneol SCHEMBL839194 0.77 EPHX2 (0.41) GAA
Dexborneol SCHEMBL14236488 0.77 EPHX2 (0.41) GAA
Dexborneol SCHEMBL5031066 0.77 EPHX2 (0.41) GAA
Dexborneol SCHEMBL23849409 0.77 EPHX2 (0.41) GAA
Dexborneol SCHEMBL9303298 0.77 EPHX2 (0.41) GAA
Borneol SCHEMBL20576251 0.77 EPHX2 (0.41) GAA
Dexborneol SCHEMBL20576252 0.77 EPHX2 (0.41) GAA
Dexborneol SCHEMBL3622754 0.77 EPHX2 (0.41) GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7608386-B2 Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same FUJITSU LIMITED (JP) 2009-10-27 US disclosed
US-20070190453-A1 Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same FUJITSU LIMITED (JP) 2007-08-16 US disclosed