SCHEMBL4285415

SCHEMBL4285415

N=C(N)SCCC(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL29150937 0.98 CYP1A2 (0.58)
Thiourea SCHEMBL30543065 0.93 CYP1A2 (0.65)
SCHEMBL4280583 0.86 CYP1A2 (0.54)
SCHEMBL10571679 0.79
SCHEMBL18541262 0.76
SCHEMBL4279640 0.74
SCHEMBL10956219 0.73 CYP1A2 (0.95)
SCHEMBL31427507 0.73 CYP1A2 (0.95)
SCHEMBL15782599 0.73
SCHEMBL12723973 0.73 TSHR (0.61)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118049885-B Estimation method of proportional guidance control direction deviation angle under inertial coordinate system 苏州星幕航天科技有限公司 2025-03-14 CN claimed
CN-119307924-A Selective etching solution for tungsten and titanium nitride/titanium 湖北兴福电子材料股份有限公司 2025-01-14 CN claimed
CN-118957552-A Super-chemical cobalt plating working solution and application thereof 杭州和韵科技有限公司 2024-11-15 CN claimed
CN-118639243-B Maintenance liquid for electrolytic cell surface for electrolytic copper foil, and preparation and application thereof 陕西中迪能环科技有限公司 2024-10-29 CN claimed
WO-2024212678-A1 NICKEL-COATED GRAPHITE POWDER, ADDITIVE, ELECTROPLATING SOLUTION AND ELECTROPLATING PROCESS THEREFOR 雅安百图高新材料股份有限公司 2024-10-17 WO claimed
CN-118639243-A Maintenance liquid for electrolytic cell surface for electrolytic copper foil, and preparation and application thereof 陕西中迪能环科技有限公司 2024-09-13 CN claimed
CN-118049885-A Estimation method of proportional guidance control direction deviation angle under inertial coordinate system 苏州星幕航天科技有限公司 2024-05-17 CN claimed
CN-117843400-A Surface-selectively metallized ceramic and preparation method and application thereof 杭州和韵科技有限公司 2024-04-09 CN claimed
CN-116875981-A Stripping solution for stripping rack, preparation method and application 广东硕成科技股份有限公司 2023-10-13 CN claimed
CN-116479489-A Nickel-coated graphite powder, additive, electroplating solution and electroplating process thereof 雅安百图高新材料股份有限公司 2023-07-25 CN claimed
CN-111118554-A Nickel plating solution 杭州东方表面技术有限公司 2020-05-08 CN claimed
CN-110714205-A Electrolytic copper foil integrated machine anode plate descaling agent for lithium ion battery and preparation and use methods thereof 铜陵市华创新材料有限公司 2020-01-21 CN claimed
US-10174432-B2 Electroplating bath and method for producing dark chromium layers ATOTECH DEUTSCHLAND GMBH (DE) 2019-01-08 US claimed
US-10006135-B2 Electroplating bath and method for producing dark chromium layers Atotech Deutschland LLP (US) 2018-06-26 US claimed
US-20170211197-A1 ELECTROPLATING BATH AND METHOD FOR PRODUCING DARK CHROMIUM LAYERS ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH) (DE) 2017-07-27 US claimed
US-9689081-B2 Electroplating bath and method for producing dark chromium layers ATOTECH DEUTSCHLAND GMBH (DE) 2017-06-27 US claimed
EP-2705176-B1 ELECTROPLATING BATH AND METHOD FOR PRODUCING DARK CHROMIUM LAYERS ATOTECH DEUTSCHLAND GMBH (DE) 2016-04-13 EP claimed
US-20160068983-A1 ELECTROPLATING BATH AND METHOD FOR PRODUCING DARK CHROMIUM LAYERS ATOTECH USA, LLC 2016-03-10 US claimed
EP-2886683-A2 Electroplating bath and method for producing dark chromium layers ATOTECH Deutschland GmbH (DE) 2015-06-24 EP claimed
US-20140042033-A1 ELECTROPLATING BATH AND METHOD FOR PRODUCING DARK CHROMIUM LAYERS ATOTECH DEUTSCHLAND GMBH (DE) 2014-02-13 US claimed