⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28602562 | 0.97 | — | — | |
| Hydrochloric Acid SCHEMBL27766999 | 0.97 | — | — | |
| SCHEMBL7722765 | 0.95 | — | — | |
| SCHEMBL29066683 | 0.85 | — | — | |
| SCHEMBL29053122 | 0.78 | — | — | |
| SCHEMBL6670196 | 0.75 | — | — | |
| SCHEMBL27729538 | 0.75 | — | — | |
| SCHEMBL515100 | 0.73 | — | — | |
| SCHEMBL5632566 | 0.73 | — | — | |
| SCHEMBL8064527 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2066 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026106029-A1 | LOW MOISTURE ABSORPTION COATED SEPARATOR AND METHOD FOR MANUFACTURING SAME | 더블유스코프코리아 주식회사 | 2026-05-21 | — | — | WO | claimed |
| US-12398241-B2 | Composition and method for reacting an organosilicon compound and a silyl hydride catalyzed by a fluorinated arylborane Lewis acid | DOW GLOBAL TECHNOLOGIES LLC (US) | 2025-08-26 | — | — | US | claimed |
| US-12350646-B1 | CO2 gas-soluble silicon nanofluid and preparation method therefor | SOUTHWEST PETROLEUM UNIVERSITY (CN) | 2025-07-08 | — | — | US | claimed |
| CN-120192613-A | Wear-resistant and crack-resistant polypropylene material and preparation method thereof | 揭阳市双展塑胶有限公司 | 2025-06-24 | — | — | CN | claimed |
| CN-120158142-A | Plant-based water-based ink and preparation method thereof | 肇庆斯塔文化用品有限公司 | 2025-06-17 | — | — | CN | claimed |
| WO-2025106343-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-05-22 | — | — | WO | claimed |
| US-20250157825-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-05-15 | — | — | US | claimed |
| CN-119751875-A | Regular structure polyorganosiloxane and preparation method thereof | 湖南大学 | 2025-04-04 | — | — | CN | claimed |
| CN-119729322-A | Hearing aid and preparation method thereof | 江苏菲沃泰纳米科技股份有限公司 | 2025-03-28 | — | — | CN | claimed |
| CN-119529670-A | Fluorine release coating, fluorine release film and application thereof | 东莞市派乐玛新材料技术开发有限公司 | 2025-02-28 | — | — | CN | claimed |
| US-5082735-A | PROCESS OF CURING METHYLHYDROSILOXANES | DOW CORNING CORPORATION (US) | 1992-01-21 | — | — | US | claimed |
| EP-0404030-A1 | Method for coating substrates with UV curable epoxysilicone compositions | GENERAL ELECTRIC COMPANY (US) | 1990-12-27 | — | — | EP | claimed |
| US-4963348-A | ADHESIVE COPOLYMER AND VOLATILE DILUENT | THE PROCTER & GAMBLE COMPANY (US) | 1990-10-16 | — | — | US | claimed |
| US-4954597-A | ALLYL ESTER, METAL CATALYST | DOW CORNING CORPORATION (US) | 1990-09-04 | — | — | US | claimed |
| US-4954364-A | RELEASE AGENTS | GENERAL ELECTRIC COMPANY (US) | 1990-09-04 | — | — | US | claimed |
| US-4954401-A | Process of curing methylhydrosiloxanes | DOW CORNING CORPORATION (US) | 1990-09-04 | — | — | US | claimed |
| US-4912242-A | Process for preparing silicon esters | DOW CORNING CORPORATION (US) | 1990-03-27 | — | — | US | claimed |
| EP-0323715-A2 | Hair styling agents and compositions containing the same | THE PROCTER & GAMBLE COMPANY (US) | 1989-07-12 | — | — | EP | claimed |
| EP-0243006-A2 | Block-graft copolymers and process for producing the same | Shin-Etsu Chemical Co., Ltd. (JP) | 1987-10-28 | — | — | EP | claimed |
| US-4048356-A | METAL ELECTRODES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1977-09-13 | — | — | US | claimed |