SCHEMBL430122

SCHEMBL430122

C=CCOCCC(C)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL32668764 1.00
SCHEMBL32668658 1.00
SCHEMBL30076347 0.83 TDP1 (0.43)
SCHEMBL509037 0.81
SCHEMBL1645830 0.81
SCHEMBL13943216 0.80 HSD17B10 (0.52)
2-Pentanol SCHEMBL29145290 0.80 CA1 (0.41)
1,3-Butanediol SCHEMBL5927899 0.80 CA1 (0.41)
SCHEMBL3936453 0.78 TDP1 (0.43)
SCHEMBL3936457 0.78 TDP1 (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024247735-A1 REPAIR METHOD FOR ROADBED DIC株式会社 2024-12-05 WO disclosed
CN-117733975-A Surface modifier for wood base material and wood material DIC株式会社 2024-03-22 CN disclosed
CN-117425857-A Photosensitive composition, cured film using same, color filter, optical filter, image display device, solid-state imaging element, and infrared sensor 东洋油墨SC控股株式会社 2024-01-19 CN disclosed
CN-113045714-B Low odor resin composition 株式会社力森诺科 2023-09-15 CN disclosed
CN-116266033-A Photosensitive coloring composition for blue color filter, solid-state imaging element, and liquid crystal display device 东洋油墨SC控股株式会社 2023-06-20 CN disclosed
CN-115685673-A Photosensitive composition, optical filter, image display device, and solid-state imaging element 东洋油墨SC控股株式会社 2023-02-03 CN disclosed
CN-109071777-B Composition for carbon fiber-reinforced resin, carbon fiber-reinforced resin composition, and cured product 昭和电工株式会社 2022-06-10 CN disclosed
US-20220049039-A1 RADICAL POLYMERIZABLE RESIN COMPOSITION AND STRUCTURE REPAIRING MATERIAL SHOWA DENKO K.K. (JP) 2022-02-17 US disclosed
US-20210283655-A1 STRUCTURE REPAIRING METHOD SHOWA DENKO K.K. (JP) 2021-09-16 US disclosed
EP-3858805-A1 STRUCTURE REPAIRING METHOD Showa Denko K.K. (JP) 2021-08-04 EP disclosed
US-20030060563-A1 Fumarate derivative, method for producing the same SHOWA DENKO K.K. (JP) 2003-03-27 US disclosed
EP-0924247-B1 Thermosetting resin composition and producing process thereof NIPPON CATALYTIC CHEM IND (JP) 2003-03-19 EP disclosed
EP-1276119-A2 Composition for resin-bonded magnet, and resin-bonded magnet using the same SUMITOMO METAL MINING COMPANY LIMITED (JP) 2003-01-15 EP disclosed
US-6376702-B1 A 1-ALKENYL ETHER SHOWA DENKO K.K. (JP) 2002-04-23 US disclosed
WO-2002006206-A2 FUMARATE DERIVATIVE, METHOD FOR PRODUCING THE SAME SHOWA DENKO K.K. (JP) 2002-01-24 WO disclosed
US-6204410-B1 FOR FREE RADICAL POLYMERIZATION SHOWA DENKO KABUSHIKI KAISHA (JP) 2001-03-20 US disclosed
US-6140396-A RESIN COMPOSITION INCLUDING N-OXYLS HAVING A SPECIFIC STRUCTURE AND A SYNTHETIC RESIN, SUCH AS A VINYL ESTER RESIN, AN URETHANE(METH)ACRYLATE RESIN, AN UNSATURATED POLYESTER RESIN, A POLYESTER(METH)ACRYLATE RESIN, AND ACRYLIC SYRUP NIPPON SHOKUBAI CO., LTD. (JP) 2000-10-31 US disclosed
EP-0957079-A1 NEW ETHER COMPOUNDS AND PROCESS FOR PRODUCING THE SAME Showa Denko Kabushiki Kaisha (JP) 1999-11-17 EP disclosed
EP-0924247-A1 Thermosetting resin composition and producing process thereof NIPPON SHOKUBAI CO., LTD. (JP) 1999-06-23 EP disclosed
US-4983311-A BINDER IS VINYL CHLORIDE COPOLYMER CONTAINING HYDROXYL GROUP CONTAINING UNSATURATED ETHER NIPPON ZEON CO., LTD. (JP) 1991-01-08 US disclosed