Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL3265114 | 0.94 | MEN1 (0.46) | — | |
| Sulfuric Acid SCHEMBL30804072 | 0.94 | — | — | |
| Sulfuric Acid SCHEMBL66745 | 0.94 | — | — | |
| Sulfuric Acid SCHEMBL2015462 | 0.94 | MEN1 (0.46) | — | |
| Sulfuric Acid SCHEMBL22639011 | 0.94 | MEN1 (0.46) | — | |
| Sulfuric Acid SCHEMBL6656 | 0.94 | — | — | |
| Sulfuric Acid SCHEMBL14359910 | 0.88 | — | — | |
| Sulfuric Acid SCHEMBL4300990 | 0.88 | — | — | |
| Sulfuric Acid SCHEMBL14774742 | 0.88 | — | — | |
| Sulfuric Acid SCHEMBL10423680 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4895821-A | MOISTURE RESISTANT, EXHAUST SYSTEM REDUCTION OF NITROGEN OXIDES | DIDIER-WERKE AG (DE) | 1990-01-23 | — | — | US | claimed |
| US-8652577-B2 | Method of manufacturing cathode active material | SONY CORPORATION (JP) | 2014-02-18 | — | — | US | disclosed |
| US-20090200510-A1 | METHOD OF MANUFACTURING CATHODE ACTIVE MATERIAL | SONY CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |