SCHEMBL4312698

SCHEMBL4312698

[CH2]CCCCCN(CC(C)N)CC(C)N

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
PLA2G1B P04054 1/20 0.31
PLA2G2A P14555 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12227393 0.89 PLA2G1B (0.37) PLA2G1BPLA2G2A
SCHEMBL12227395 0.80 CHRM2 (0.46)
SCHEMBL4312699 0.80 PLA2G1B (0.50) PLA2G1BPLA2G2A
SCHEMBL14039325 0.80 PLA2G1B (0.50) PLA2G1BPLA2G2A
SCHEMBL7151720 0.80 PLA2G1B (0.50) PLA2G1BPLA2G2A
SCHEMBL3246345 0.79 CYP1A2 (0.36)
SCHEMBL11727919 0.76 PLA2G1B (0.50) PLA2G1BPLA2G2A
SCHEMBL11820756 0.76 PLA2G1B (0.50) PLA2G1BPLA2G2A
SCHEMBL11727377 0.76 PLA2G1B (0.50) PLA2G1BPLA2G2A
SCHEMBL4889045 0.76 PLA2G1B (0.50) PLA2G1BPLA2G2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090189118-A1 Liquid Maleated Butyl Rubber LANXESS INC. (US) 2009-07-30 US disclosed
US-6899980-B2 Photomask material and process of producing photomask from the photomask material FUJI PHOTO FILM CO., LTD. (JP) 2005-05-31 US disclosed
US-20030091908-A1 Photomask material and process of producing photomask from the photomask material FUJI PHOTO FILM CO., LTD. (JP) 2003-05-15 US disclosed
EP-0490515-B1 Method for preparing lithographic printing plate FUJI PHOTO FILM CO LTD (JP) 1997-10-15 EP disclosed
US-5480762-A Method for preparing lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1996-01-02 US disclosed
US-5124234-A Protective coating for printed circuits FUJI PHOTO FILM CO., LTD. (JP) 1992-06-23 US disclosed
EP-0490515-A1 Method for preparing lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1992-06-17 EP disclosed
US-5030548-A Photoiniator system comprising a 4,4'-bis(dialkylamino) benzophenone, an aromatic ketone and lophine dimer; also present a halogen compound leuco and dye; lithography; printing plates; photoresists FUJI PHOTO FILM CO., LTD. (JP) 1991-07-09 US disclosed
US-4948700-A PHOTOPOLYMERIZABLE COMPOSITION OF EPOXY NOVOLAKS, UNSATURATED ACIS, POLYBASIC ANHYDRIDES, UNSATURATED ETHYLENIC COMPOUNDS, EPOXY COMPONENTS; CURING, MASHING, PRINTED CIRCUITS FUJI PHOTO FILM CO., LTD. (JP) 1990-08-14 US disclosed
US-4572888-A DRY FILM PHOTO RESISTS INCORPORATING A CARBOTHIO ACID AMIDE OR A THIO=HYDRAZIDE FUJI PHOTO FILM CO., LTD. (JP) 1986-02-25 US disclosed
US-4543318-A PHOTORESISTS FOR CIRCUIT BOARDS AND PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 1985-09-24 US disclosed
EP-0131824-A2 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1985-01-23 EP disclosed
US-4304838-A FILMS FOR PEELABLE DEVELOPMENT FUJI PHOTO FILM CO., LTD. (JP) 1981-12-08 US disclosed
US-4058443-A PHOTOPOLYMERIZATION, BINDER, CHLORINATED POLYOLEFIN FUJI PHOTO FILM CO., LTD. (JA) 1977-11-15 US disclosed
US-4058398-A ETHYLENICALLY UNSATURATED MONOMER, POLYVINYL BUTYRAL, HETEROCYCLIC NITROGEN PHOTOINITIATOR FUJI PHOTO FILM CO., LTD. (JA) 1977-11-15 US disclosed