SCHEMBL4313166

SCHEMBL4313166

O=S(=O)(CC(F)(F)F)OC1CCC(OS(=O)(=O)CC(F)(F)F)CC1

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14778042 0.91 CA1 (0.43) CA1CA2
SCHEMBL14778879 0.90 CA1 (0.47) CA1CA2
SCHEMBL4318490 0.84 CA1 (0.32) CA1CA2
SCHEMBL13172176 0.78 CYP2D6 (0.51)
SCHEMBL15518599 0.74
SCHEMBL15518602 0.73
SCHEMBL15519233 0.73
SCHEMBL14780172 0.72 CA1 (0.39) CA1CA2
SCHEMBL14779318 0.72 CA1 (0.39) CA1CA2
SCHEMBL14779150 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024090531-A1 CATION-CURABLE COMPOSITION 日産化学株式会社 2024-05-02 WO disclosed
US-7595144-B2 Sulfonate-containing anti-reflective coating forming composition for lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-09-29 US disclosed
US-20080003524-A1 Sulfonate-Containing Anti-Reflective Coating Forming Composition for Lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-01-03 US disclosed
EP-1813987-A1 SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY Nissan Chemical Industries, Ltd. (JP) 2007-08-01 EP disclosed