⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL137937 | 0.87 | — | — | |
| Hydrochloric Acid SCHEMBL4395993 | 0.82 | — | — | |
| SCHEMBL6855556 | 0.58 | — | — | |
| SCHEMBL2108630 | 0.58 | — | — | |
| SCHEMBL91 | 0.58 | — | — | |
| SCHEMBL10886783 | 0.52 | — | — | |
| Methane SCHEMBL2045187 | 0.52 | — | — | |
| Fluoride SCHEMBL6881674 | 0.52 | — | — | |
| SCHEMBL365541 | 0.52 | — | — | |
| SCHEMBL539827 | 0.51 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090227111-A1 | BARRIER FILM MATERIAL AND PATTERN FORMATION METHOD USING THE SAME | PANASONIC CORPORATION (JP) | 2009-09-10 | — | — | US | disclosed |
| US-7550253-B2 | Barrier film material and pattern formation method using the same | PANASONIC CORPORATION (JP) | 2009-06-23 | — | — | US | disclosed |
| CN-100456421-C | Barrier film material and pattern formation method using the same | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2009-01-28 | — | — | CN | disclosed |
| EP-1594004-A2 | Barrier film material and pattern formation method using the same | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-11-09 | — | — | EP | disclosed |
| CN-1661776-A | Barrier film material and pattern formation method using the same | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2005-08-31 | — | — | CN | disclosed |
| US-20050186516-A1 | Barrier film material and pattern formation method using the same | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2005-08-25 | — | — | US | disclosed |