Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.52 |
| ▸ | SHBG | P04278 | 1/20 | 0.41 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.39 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.39 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.39 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.39 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.39 |
| ▸ | ACHE | P22303 | 1/20 | 0.39 |
| ▸ | SIGMAR1 | Q99720 | 3/20 | 0.37 |
| ▸ | ADH1C | P00326 | 2/20 | 0.36 |
| ▸ | ADH1A | P07327 | 2/20 | 0.36 |
| ▸ | ADH1B | P00325 | 1/20 | 0.36 |
| ▸ | ADH4 | P08319 | 1/20 | 0.36 |
| ▸ | ADH7 | P40394 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5484 | 1.00 | — | — | |
| SCHEMBL3032796 | 1.00 | CYP1A2 (0.52) | CYP1A2SHBGCHRM5ADRA2CCHRM2 | |
| SCHEMBL18481332 | 1.00 | CYP1A2 (0.52) | CYP1A2SHBGCHRM5ADRA2CCHRM2 | |
| SCHEMBL1437788 | 1.00 | CYP1A2 (0.52) | CYP1A2SHBGCHRM5ADRA2CCHRM2 | |
| Cyclohexane SCHEMBL10836383 | 1.00 | CYP1A2 (0.52) | CYP1A2SHBGCHRM5ADRA2CCHRM2 | |
| Cyclopentane SCHEMBL9453150 | 1.00 | CYP1A2 (0.52) | CYP1A2SHBGCHRM5ADRA2CCHRM2 | |
| SCHEMBL25446788 | 1.00 | CYP1A2 (0.52) | CYP1A2SHBGCHRM5ADRA2CCHRM2 | |
| SCHEMBL18078965 | 1.00 | CYP1A2 (0.52) | CYP1A2SHBGCHRM5ADRA2CCHRM2 | |
| SCHEMBL4576671 | 1.00 | CYP1A2 (0.52) | CYP1A2SHBGCHRM5ADRA2CCHRM2 | |
| Cyclohexane SCHEMBL8731700 | 1.00 | CYP1A2 (0.52) | CYP1A2SHBGCHRM5ADRA2CCHRM2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9057951-B2 | Chemically amplified photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-06-16 | — | — | US | claimed |
| WO-2011023497-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-03-03 | — | — | WO | claimed |
| CN-110462516-B | Positive photoresist composition, pattern produced therefrom and method for producing pattern | 株式会社LG化学 | 2023-01-17 | — | — | CN | disclosed |
| US-11531268-B2 | Positive-working photoresist composition, pattern produced therefrom, and method for producing pattern | LG CHEM, LTD. (KR) | 2022-12-20 | — | — | US | disclosed |
| CN-108698824-B | Process for preparing polymeric sulfur | 伊士曼化工公司 | 2022-08-16 | — | — | CN | disclosed |
| CN-109429511-B | Positive photoresist composition, photoresist pattern using the same, and method for manufacturing photoresist pattern | 株式会社LG化学 | 2022-01-28 | — | — | CN | disclosed |
| US-11003077-B2 | Positive photoresist composition, photoresist pattern using the same, and manufacturing method of the photoresist pattern | LG CHEM, LTD. (KR) | 2021-05-11 | — | — | US | disclosed |
| US-20190146338-A1 | POSITIVE PHOTORESIST COMPOSITION, PHOTORESIST PATTERN USING THE SAME, AND MANUFACTURING METHOD OF THE PHOTORESIST PATTERN | LG CHEM, LTD. (KR) | 2019-05-16 | — | — | US | disclosed |
| US-9117657-B2 | Method for filling recesses using pre-treatment with hydrocarbon-containing gas | ASM IP HOLDING B.V. (NL) | 2015-08-25 | — | — | US | disclosed |
| US-9057951-B2 | Chemically amplified photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-06-16 | — | — | US | disclosed |
| US-20140363983-A1 | Method For Filling Recesses Using Pre-Treatment With Hydrocarbon-Containing Gas | ASM IP HOLDING B.V. (NL) | 2014-12-11 | — | — | US | disclosed |
| US-20130284674-A1 | ORGANIC COMPOUND ADSORBING MATERIAL AND PROCESS FOR MAKING THE SAME | DYNAMIC ADSORBENTS, INC. | 2013-10-31 | — | — | US | disclosed |
| CN-103260746-A | Organic compound adsorbing material and process for making the same | DYNAMIC ADSORBENTS INC | 2013-08-21 | — | — | CN | disclosed |
| EP-2595742-A2 | ORGANIC COMPOUND ADSORBING MATERIAL AND PROCESS FOR MAKING THE SAME | Dynamic Adsorbents, Inc (US) | 2013-05-29 | — | — | EP | disclosed |
| WO-2012012735-A2 | ORGANIC COMPOUND ADSORBING MATERIAL AND PROCESS FOR MAKING THE SAME | DYNAMIC ADSORBENTS, INC. (US) | 2012-01-26 | — | — | WO | disclosed |
| WO-2011023497-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-03-03 | — | — | WO | disclosed |
| WO-2004041770-A1 | CHEMICALLY AMPLIFIED POLYMER HAVING PENDANT GROUP WITH CYCLODODECYL AND RESIST COMPOSITION COMPRISING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-05-21 | — | — | WO | disclosed |
| US-6245727-B1 | Discontinuous process for conducting a heterogeneously catalyzed reaction and installation for heterogeneously catalyzed manufacture of products | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 2001-06-12 | — | — | US | disclosed |