⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28058009 | 0.89 | CA12 (0.60) | — | |
| SCHEMBL26603013 | 0.87 | CA12 (0.35) | — | |
| SCHEMBL3343857 | 0.87 | CA12 (0.62) | — | |
| SCHEMBL28072132 | 0.86 | CA12 (0.58) | — | |
| SCHEMBL3959991 | 0.86 | CA12 (0.61) | — | |
| SCHEMBL9738664 | 0.82 | CA12 (0.59) | — | |
| SCHEMBL7971206 | 0.78 | CA12 (0.53) | — | |
| SCHEMBL13708372 | 0.78 | — | — | |
| SCHEMBL15381 | 0.77 | — | — | |
| SCHEMBL5314937 | 0.77 | CA12 (1.00) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 482 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3848417-B1 | COMPOSITION FOR COPPER ELECTROPLATING COMPRISING LEVELING AGENT | BASF SE (DE) | 2025-01-08 | — | — | EP | claimed |
| EP-3848417-A1 | COMPOSITION FOR COPPER ELECTROPLATING COMPRISING LEVELING AGENT | BASF SE (DE) | 2021-07-14 | — | — | EP | claimed |
| EP-2504396-B1 | COMPOSITION FOR COPPER ELECTROPLATING COMPRISING LEVELING AGENT | BASF SE (DE) | 2021-02-24 | — | — | EP | claimed |
| EP-2714807-B1 | COMPOSITION FOR METAL ELECTROPLATING COMPRISING AN ADDITIVE FOR BOTTOM-UP FILLING OF THOUGH SILICON VIAS AND INTERCONNECT FEATURES | BASF SE (DE) | 2019-01-02 | — | — | EP | claimed |
| US-9631292-B2 | Composition for metal electroplating comprising an additive for bottom-up filling of though silicon vias and interconnect features | BASF SE (DE) | 2017-04-25 | — | — | US | claimed |
| US-9598540-B2 | Composition for metal electroplating comprising leveling agent | BASF SE (DE) | 2017-03-21 | — | — | US | claimed |
| CN-103547631-B | Comprise the composition for metal electroplating for the perforation of bottom-up filling silicon and the additive of interconnection part feature | 巴斯夫欧洲公司 | 2016-07-06 | — | — | CN | claimed |
| CN-102639639-B | Composition for metal electroplating comprising leveling agent | BASF SE | 2015-06-03 | — | — | CN | claimed |
| US-20140097092-A1 | COMPOSITION FOR METAL ELECTROPLATING COMPRISING AN ADDITIVE FOR BOTTOM-UP FILLING OF THOUGH SILICON VIAS AND INTERCONNECT FEATURES | BASF SE (DE) | 2014-04-10 | — | — | US | claimed |
| WO-2012164509-A1 | COMPOSITION FOR METAL ELECTROPLATING COMPRISING AN ADDITIVE FOR BOTTOM-UP FILLING OF THOUGH SILICON VIAS AND INTERCONNECT FEATURES | BASF SE (DE) | 2012-12-06 | — | — | WO | claimed |
| EP-2530102-A1 | Additive and composition for metal electroplating comprising an additive for bottom-up filling of though silicon vias | BASF SE (DE) | 2012-12-05 | — | — | EP | claimed |
| US-20120292193-A1 | COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT | BASF SE (DE) | 2012-11-22 | — | — | US | claimed |
| EP-2504396-A2 | COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT | BASF SE (DE) | 2012-10-03 | — | — | EP | claimed |
| WO-2011064154-A2 | COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT | BASF SE (DE) | 2011-06-03 | — | — | WO | claimed |
| US-20100291301-A1 | JOINTING COMPOSITION AND METHOD | EXCEL POLYMERS LLC (US) | 2010-11-18 | — | — | US | claimed |
| US-5641855-A | Water-soluble condensation products of amino-containing compounds and crosslinkers, preparation thereof and use thereof | BASF AKTIENGESELLSCHAFT (DE) | 1997-06-24 | — | — | US | claimed |
| US-4473700-A | DISPERSANT FOR LUBRICANTS | TEXACO INC. (US) | 1984-09-25 | — | — | US | claimed |
| JP-6228483-A | — | — | None | — | — | JP | disclosed |
| EP-0061169-A1 | Method for the elimination of anionic substances from water | BASF Aktiengesellschaft (DE) | 1982-09-29 | — | — | EP | disclosed |
| US-4184019-A | CATIONIC POLYMERS | ROHM AND HAAS COMPANY (US) | 1980-01-15 | — | — | US | disclosed |