Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.39 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6865187 | 0.75 | AOC3 (0.39) | TSHRAOC3LMNA | |
| SCHEMBL27985943 | 0.75 | — | — | |
| SCHEMBL11045664 | 0.72 | TSHR (0.44) | TSHR | |
| SCHEMBL37604 | 0.72 | TSHR (0.44) | TSHR | |
| SCHEMBL10629420 | 0.72 | TSHR (0.44) | TSHR | |
| SCHEMBL9193301 | 0.71 | — | — | |
| SCHEMBL8743481 | 0.69 | — | — | |
| SCHEMBL15966 | 0.69 | — | — | |
| SCHEMBL321887 | 0.69 | TSHR (0.41) | TSHR | |
| SCHEMBL15288 | 0.69 | TSHR (0.41) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8084184-B2 | Composition for removing photoresist and method of manufacturing an array substrate using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-12-27 | — | — | US | claimed |
| US-20090170037-A1 | COMPOSITION FOR REMOVING PHOTORESIST AND METHOD OF MANUFACTURING AN ARRAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-07-02 | — | — | US | claimed |
| EP-1154868-A4 | NON-CORROSIVE CLEANING COMPOSITION AND METHOD FOR REMOVING PLASMA ETCHING RESIDUES | ARCH SPEC CHEM INC (US) | 2004-03-24 | — | — | EP | claimed |
| EP-1154868-A1 | NON-CORROSIVE CLEANING COMPOSITION AND METHOD FOR REMOVING PLASMA ETCHING RESIDUES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2001-11-21 | — | — | EP | claimed |
| US-6103680-A | COMPRISING A HYDROXY-(LOWER ALKYL)-HYDRAZINE, WATER, AND AT LEAST ONE CARBOXYLIC ACID SELECTED FROM CITRIC ACID, LACTIC ACID, SUCCINIC ACID, TARTARIC ACID, ETHYLENEDIAMINETETRAACETIC ACID, NITRILOTRIACETIC ACID | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-08-15 | — | — | US | claimed |
| WO-2000040347-A1 | NON-CORROSIVE CLEANING COMPOSITION AND METHOD FOR REMOVING PLASMA ETCHING RESIDUES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-07-13 | — | — | WO | claimed |
| WO-1996004223-A1 | REDUCED VOLATILITY SUBSTITUTED HYDRAZINE COMPOUNDS IN LIQUID PROPELLANTS | OLIN CORPORATION (US) | 1996-02-15 | — | — | WO | claimed |
| US-5433802-A | Hydroxy or cyano substituted hydrazines, nitrogen oxide oxidizers | OLIN CORPORATION (US) | 1995-07-18 | — | — | US | claimed |
| CN-103145960-B | Aliphatic-aromatic copolyester and preparation method thereof | SHANDONG FUWIN NEW MATERIAL CO., LTD. (CN) | 2015-12-09 | — | — | CN | disclosed |
| CN-103145960-A | Aliphatic-aromatic copolyester and preparation method thereof | SHANDONG FUWIN NEW MATERIAL CO LTD | 2013-06-12 | — | — | CN | disclosed |
| US-8084184-B2 | Composition for removing photoresist and method of manufacturing an array substrate using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-12-27 | — | — | US | disclosed |
| CN-101636464-A | Moisture-curable urethane composition for waterproof material and urethane waterproof material | DAINIPPON INK & CHEMICALS | 2010-01-27 | — | — | CN | disclosed |
| US-20090170037-A1 | COMPOSITION FOR REMOVING PHOTORESIST AND METHOD OF MANUFACTURING AN ARRAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-07-02 | — | — | US | disclosed |
| CN-1523066-A | moisture-curable urethane composition | 大日本油墨化学工业株式会社 | 2004-08-25 | — | — | CN | disclosed |
| EP-0970149-A1 | WATER-SOLUBLE QUINACRIDONES | BASF AKTIENGESELLSCHAFT (DE) | 2000-01-12 | — | — | EP | disclosed |
| WO-1998041583-A1 | COLORANT SALTS AND THEIR USE IN DYEING POLYMER MATERIALS | BASF AKTIENGESELLSCHAFT (DE) | 1998-09-24 | — | — | WO | disclosed |
| WO-1998041582-A1 | WATER-SOLUBLE QUINACRIDONES | BASF AKTIENGESELLSCHAFT (DE) | 1998-09-24 | — | — | WO | disclosed |
| WO-1996004223-A1 | REDUCED VOLATILITY SUBSTITUTED HYDRAZINE COMPOUNDS IN LIQUID PROPELLANTS | OLIN CORPORATION (US) | 1996-02-15 | — | — | WO | disclosed |
| US-5433802-A | Hydroxy or cyano substituted hydrazines, nitrogen oxide oxidizers | OLIN CORPORATION (US) | 1995-07-18 | — | — | US | disclosed |
| US-4211699-A | FROM A DIISOCYANATE, AN AMINO- OR HYDRAZINO DIOL, AND A MASKING LACTAM | BAYER AKTIENGESELLSCHAFT (DE) | 1980-07-08 | — | — | US | disclosed |