Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.76 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | APEX1 | P27695 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8526246 | 0.91 | TSHR (0.63) | TSHRALDH1A1THRB | |
| SCHEMBL16584703 | 0.88 | TSHR (0.59) | TSHRALDH1A1THRB | |
| SCHEMBL13147171 | 0.87 | TSHR (0.63) | TSHRALDH1A1THRB | |
| SCHEMBL18710301 | 0.87 | TSHR (0.63) | TSHRALDH1A1THRB | |
| SCHEMBL19402683 | 0.87 | TSHR (0.63) | TSHRALDH1A1THRB | |
| SCHEMBL24562 | 0.86 | TSHR (1.00) | TSHRALDH1A1THRBPOLBAPEX1 | |
| SCHEMBL9067942 | 0.85 | TSHR (0.67) | TSHRALDH1A1THRB | |
| SCHEMBL761374 | 0.85 | TSHR (0.73) | TSHRALDH1A1THRBPOLBAPEX1 | |
| SCHEMBL1336820 | 0.85 | TSHR (0.73) | TSHRALDH1A1THRBPOLBAPEX1 | |
| SCHEMBL160208 | 0.85 | TSHR (0.73) | TSHRALDH1A1THRBPOLBAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11735737-B2 | Binder for electricity storage devices improving dispersibility of conductive assistant | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2023-08-22 | — | — | US | disclosed |
| US-10272426-B2 | Method of producing microfluidic device, microfluidic device, and photosensitive resin composition | JSR CORPORATION (JP) | 2019-04-30 | — | — | US | disclosed |
| EP-3085661-B1 | METHOD OF PRODUCING MICROFLUIDIC DEVICE | JSR CORP (JP) | 2017-12-27 | — | — | EP | disclosed |
| US-20170127533-A1 | PRODUCTION PROCESS FOR SOLDER ELECTRODE, PRODUCTION PROCESS FOR LAMINATE, LAMINATE AND ELECTRONIC PART | JSR CORPORATION (JP) | 2017-05-04 | — | — | US | disclosed |
| US-9625706-B2 | Display element, photosensitive composition and electrowetting display | JSR CORPORATION (JP) | 2017-04-18 | — | — | US | disclosed |
| US-20160310944-A1 | METHOD OF PRODUCING MICROFLUIDIC DEVICE, MICROFLUIDIC DEVICE, AND PHOTOSENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2016-10-27 | — | — | US | disclosed |
| EP-3085661-A1 | METHOD OF PRODUCING MICROFLUIDIC DEVICE, MICROFLUIDIC DEVICE, AND PHOTOSENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2016-10-26 | — | — | EP | disclosed |
| US-20090288855-A1 | POSITIVE-TYPE RADIATION-SENSITIVE RESIN COMPOSITION FOR PRODUCING A METAL-PLATING FORMED MATERIAL, TRANSCRIPTION FILM AND PRODUCTION METHOD OF A METAL-PLATING FORMED MATERIAL | JSR CORPORATION (JP) | 2009-11-26 | — | — | US | disclosed |
| US-20070031758-A1 | Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material | JSR CORPORATION (JP) | 2007-02-08 | — | — | US | disclosed |
| EP-1750176-A2 | Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material | JSR Corporation (JP) | 2007-02-07 | — | — | EP | disclosed |