SCHEMBL433517

SCHEMBL433517

COC(C)C=COC=CC(C)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4237086 1.00
SCHEMBL20081731 0.88
SCHEMBL1812244 0.80
SCHEMBL7773055 0.79
SCHEMBL7773061 0.79
SCHEMBL4611130 0.77
SCHEMBL11655751 0.76
SCHEMBL17039095 0.73
SCHEMBL9812215 0.73
SCHEMBL14231329 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 241 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260040695-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER NEWSOUTH INNOVATIONS PTY LTD (AU) 2026-02-05 US claimed
EP-4562077-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER NewSouth Innovations Pty Limited (AU) 2025-06-04 EP claimed
WO-2024020649-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER NEWSOUTH INNOVATIONS PTY LIMITED (AU) 2024-02-01 WO claimed
WO-2022261721-A1 HEALABLE AND REPROCESSABLE COMPOSITIONS DEAKIN UNIVERSITY (AU) 2022-12-22 WO claimed
EP-2481760-B1 INITIATOR SYSTEM FOR CATIONIC POLYMERIZATION AND POLYMERIZATION METHOD USING SAME CHINA PETROLEUM & CHEM CORP (CN) 2021-05-05 EP claimed
EP-0425436-B1 Reactive silicone and/or fluorine containing hydrophilic prepolymers and polymers thereof CIBA GEIGY AG (CH) 1996-12-27 EP claimed
US-20260040695-A1 A METHOD TO GENERATE CONDUCTIVE POLYMER NEWSOUTH INNOVATIONS PTY LTD (AU) 2026-02-05 US disclosed
EP-4644483-A1 FLUORINE-CONTAINING COPOLYMER COMPOSITION AND CROSSLINKED PRODUCT OF SAME AGC INC. (JP) 2025-11-05 EP disclosed
US-20250304739-A1 FLUORINE-CONTAINING COPOLYMER COMPOSITION AND CROSSLINKED PRODUCT OF SAME AGC Inc. (JP) 2025-10-02 US disclosed
EP-3665172-B1 COMPOUNDS AS POTENTIAL DYE MOLECULES Lleaf Pty Ltd (AU) 2025-03-19 EP disclosed
CN-112987515-B Method of manufacturing semiconductor device and semiconductor device manufacturing tool 台湾积体电路制造股份有限公司 2024-09-06 CN disclosed
CN-118444522-A Dose-reducing bottom antireflective coating for metallic photoresists 台湾积体电路制造股份有限公司 2024-08-06 CN disclosed
CN-118169970-A Method for manufacturing semiconductor device and CMOS image sensor 台湾积体电路制造股份有限公司 2024-06-11 CN disclosed
US-4548990-A HIGH DEGREE OF SWELLING IN ORGANIC SOLVENTS CIBA-GEIGY CORPORATION (US) 1985-10-22 US disclosed
EP-0157639-A2 Heat-developable multilayered color photo-sensitive material KONICA CORPORATION (JP) 1985-10-09 EP disclosed
EP-0140828-A2 Cross-linked porous polymers for controlled drug release CIBA-GEIGY AG (CH) 1985-05-08 EP disclosed
EP-0033081-B1 ANIONIC COPOLYMERS CONTAINING POLYVALENT METAL CATIONS AND THEIR USE IN PHOTOGRAPHIC MATERIALS Agfa-Gevaert AG (DE) 1985-04-24 EP disclosed
EP-0048412-B1 PHOTOGRAPHIC MATERIAL WITH A TEMPORARY BARRIER LAYER Agfa-Gevaert AG (DE) 1984-06-20 EP disclosed
EP-0048412-A1 Photographic material with a temporary barrier layer Agfa-Gevaert AG (DE) 1982-03-31 EP disclosed
EP-0033081-A1 Anionic copolymers containing polyvalent metal cations and their use in photographic materials Agfa-Gevaert AG (DE) 1981-08-05 EP disclosed