⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7528731 | 0.85 | GABRR1 (0.43) | — | |
| SCHEMBL23235 | 0.78 | — | — | |
| SCHEMBL874479 | 0.78 | — | — | |
| SCHEMBL16506131 | 0.78 | — | — | |
| SCHEMBL12894318 | 0.78 | — | — | |
| SCHEMBL56569 | 0.76 | — | — | |
| Ammonia Solution, Strong SCHEMBL8650326 | 0.76 | — | — | |
| SCHEMBL22828000 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL11420577 | 0.74 | — | — | |
| SCHEMBL874007 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8642718-B2 | Curable composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-02-04 | — | — | US | disclosed |
| EP-2072560-A2 | Manufacturing method and apparatus of optical material | SEIKO EPSON CORPORATION (JP) | 2009-06-24 | — | — | EP | disclosed |
| US-20090156781-A1 | Manufacturing Method and Apparatus of Optical Material | SEIKO EPSON CORPORATION (JP) | 2009-06-18 | — | — | US | disclosed |
| US-20090018308-A1 | Curable Composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2009-01-15 | — | — | US | disclosed |
| EP-1882713-A1 | CURABLE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2008-01-30 | — | — | EP | disclosed |