SCHEMBL433929

SCHEMBL433929

CCO[Ti](OCC)OCC

nearest known ligand 0.30

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MGAM O43451 1/20 0.30
GAA P10253 1/20 0.30
SI P14410 1/20 0.30
MGAM2 Q2M2H8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL232158 0.96
Bromide SCHEMBL495676 0.96
Ethane SCHEMBL18528767 0.96
Iodide SCHEMBL9486260 0.96
Methane SCHEMBL18528719 0.96
SCHEMBL7070224 0.78
SCHEMBL27625659 0.73
Ethane SCHEMBL18528511 0.70
Methane SCHEMBL18528750 0.70
SCHEMBL9661311 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119797564-A Treatment method of polyolefin catalyst waste liquid 任丘市利和科技发展有限公司 2025-04-11 CN claimed
CN-119750485-A High-temperature pressure-resistant MEMS pressure sensor and packaging technology thereof 广东华兰海电测科技股份有限公司 2025-04-04 CN claimed
CN-119797564-A Treatment method of polyolefin catalyst waste liquid 任丘市利和科技发展有限公司 2025-04-11 CN disclosed
CN-119750485-A High-temperature pressure-resistant MEMS pressure sensor and packaging technology thereof 广东华兰海电测科技股份有限公司 2025-04-04 CN disclosed
CN-117396811-A Composition for forming underlayer film of silicon-containing resist 日产化学株式会社 2024-01-12 CN disclosed
CN-117396810-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2024-01-12 CN disclosed
CN-117083570-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2023-11-17 CN disclosed
US-20230298884-A1 ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL LAM RES CORP (US) 2023-09-21 US disclosed
CN-116547343-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2023-08-04 CN disclosed
US-11670503-B2 Method of atomic layer deposition LAM RESEARCH CORPORATION (US) 2023-06-06 US disclosed
US-11646198-B2 Ultrathin atomic layer deposition film accuracy thickness control LAM RESEARCH CORPORATION (US) 2023-05-09 US disclosed
EP-0963789-A2 Photocatalyst-containing coating composition JAPAN as represented by DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 1999-12-15 EP disclosed
US-5981425-A A PHOTOCATALYST CONTAINING CALCIUM PHOSPHATE AND TITANIUM OXIDE; PROTECTIVE COATING; WEATHERPROOFING, NONDESTRUCTIVE; DURABILITY AND OXIDATION RESISTANCE AGENCY OF INDUSTRIAL SCIENCE & TECH. (JP) 1999-11-09 US disclosed
CN-1138048-A Catalyst for olefines polymerizing and manufacture method of polyolefine TOKUHISA CO LTD (JP) 1996-12-18 CN disclosed
US-5510406-A CHEMICAL RESISTANCE, HEAT RESISTANCE ASAHI GLASS COMPANY, LTD. (JP) 1996-04-23 US disclosed
US-5498657-A ALIPHATIC CYCLIC STRUCTURE ASAHI GLASS COMPANY LTD. (JP) 1996-03-12 US disclosed
EP-0460523-B1 Fluoropolymer composition for coating and article coated with the same ASAHI GLASS CO LTD (JP) 1995-08-02 EP disclosed
EP-0460523-A1 Fluoropolymer composition for coating and article coated with the same ASAHI GLASS COMPANY LTD. (JP) 1991-12-11 EP disclosed
EP-0127487-B1 CATALYST COMPONENT FOR POLYMERIZATION OF OLEFINS TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) 1988-10-12 EP disclosed
EP-0171155-A1 Catalyst component for polymerization of olefins Tonen Corporation (JP) 1986-02-12 EP disclosed