SCHEMBL4339944

SCHEMBL4339944

C=CCCB1N(CCC=C)B(CCC=C)N(CCC=C)B(CCC=C)N1CCC=C

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Iodide SCHEMBL5857868 0.60
Iodide SCHEMBL5858250 0.60
SCHEMBL12719804 0.59
SCHEMBL23732 0.58
SCHEMBL8852489 0.58 TSHR (0.54) TSHR
SCHEMBL11001667 0.56 CYP3A4 (0.55) TSHR
SCHEMBL2214936 0.56
SCHEMBL23116592 0.55
Hydrogen Sulfide SCHEMBL21352279 0.55 TSHR (0.50) TSHR
Phosphine SCHEMBL20503111 0.55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846148-B2 Composition for chemical vapor deposition film-formation and method for production of low dielectric constant film NIPPON SHOKUBAI CO., LTD. (JP) 2014-09-30 US disclosed
US-20090232987-A1 Composition for Chemical Vapor Deposition Film-Formation and Method for Production of Low Dielectric Constant Film NIPPON SHOKUBAI CO., LTD. (JP) 2009-09-17 US disclosed