Hypochlorous Acid

Hypochlorous Acid

SCHEMBL4340130

OCl.OP(O)O

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL574380 0.82
SCHEMBL10525209 0.82
SCHEMBL6337 0.82
SCHEMBL8442506 0.82
SCHEMBL9459264 0.77
SCHEMBL10660292 0.77
Iodide SCHEMBL23501500 0.73
SCHEMBL21951319 0.73
SCHEMBL21951585 0.73
SCHEMBL21951233 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101923294-B Composition for cleaning microelectronic substrates containing halogen oxygen acids, salts and derivatives thereof AVANTOR PERFORMANCE MAT INC 2013-12-04 CN claimed
CN-101923294-A Composition for cleaning microelectronic substrates containing halogen oxygen acids, salts and derivatives thereof MALLINCKRODT BAKER INC 2010-12-22 CN claimed
CN-1954267-B Microelectronic cleaning compositions containing halogen oxyacids, salts and derivatives thereof MALLINCKRODT BAKER INC 2010-12-08 CN claimed
US-7521406-B2 Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof MALLINCKRODT BAKER, INC (US) 2009-04-21 US claimed
EP-1847880-A2 Composition for cleaning microelectronic substrates containing halogen oxygen acids and derivatives thereof Mallinckrodt Baker, Inc. (US) 2007-10-24 EP claimed
CN-1954267-A Microelectronic cleaning compositions containing halogen oxyacids, salts and derivatives thereof MALLINCKRODT BAKER INC (US) 2007-04-25 CN claimed
WO-2005083523-A1 MICROELECTRONIC CLEANING COMPOSITION CONTAINING HALOGEN OXYGEN ACIDS, SALTS AND DERIVATIVES THEREOF MALLINCKRODT BAKER INC. (US) 2005-09-09 WO claimed
EP-1564595-A2 Composition for cleaning microelectronic substrates containing halogen oxygen acids and derivatives thereof Mallinckrodt Baker, Inc. (US) 2005-08-17 EP claimed
US-20050176603-A1 Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof RELIABLE BIOPHARMACEUTICAL, LLC 2005-08-11 US claimed
CN-103509661-A Cleanser for semiconductor device packaging LIM KENG HUAT 2014-01-15 CN disclosed
CN-101923294-B Composition for cleaning microelectronic substrates containing halogen oxygen acids, salts and derivatives thereof AVANTOR PERFORMANCE MAT INC 2013-12-04 CN disclosed
CN-101833251-B Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof AVANTOR PERFORMANCE MAT INC 2013-11-13 CN disclosed
CN-101923294-A Composition for cleaning microelectronic substrates containing halogen oxygen acids, salts and derivatives thereof MALLINCKRODT BAKER INC 2010-12-22 CN disclosed
CN-1954267-B Microelectronic cleaning compositions containing halogen oxyacids, salts and derivatives thereof MALLINCKRODT BAKER INC 2010-12-08 CN disclosed
EP-1847880-A2 Composition for cleaning microelectronic substrates containing halogen oxygen acids and derivatives thereof Mallinckrodt Baker, Inc. (US) 2007-10-24 EP disclosed
EP-1840659-A2 Composition for cleaning microelectronic substrates containing halogen oxygen acids and derivatives thereof Mallinckrodt Baker, Inc. (US) 2007-10-03 EP disclosed
CN-1954267-A Microelectronic cleaning compositions containing halogen oxyacids, salts and derivatives thereof MALLINCKRODT BAKER INC (US) 2007-04-25 CN disclosed
WO-2005083523-A1 MICROELECTRONIC CLEANING COMPOSITION CONTAINING HALOGEN OXYGEN ACIDS, SALTS AND DERIVATIVES THEREOF MALLINCKRODT BAKER INC. (US) 2005-09-09 WO disclosed
EP-1564595-A2 Composition for cleaning microelectronic substrates containing halogen oxygen acids and derivatives thereof Mallinckrodt Baker, Inc. (US) 2005-08-17 EP disclosed
US-20050176603-A1 Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof RELIABLE BIOPHARMACEUTICAL, LLC 2005-08-11 US disclosed