SCHEMBL434185

SCHEMBL434185

C/C=C\OC(C)c1ccc(N(CCC)CCC)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 3/20 0.37
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
HTT P42858 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
NPSR1 Q6W5P4 2/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
KDM4E B2RXH2 1/20 0.33
NPC1 O15118 1/20 0.33
MAPT P10636 1/20 0.33
THRB P10828 1/20 0.33
MAPK1 P28482 1/20 0.33
RAB9A P51151 1/20 0.33
ATM Q13315 1/20 0.33
CASR P41180 1/20 0.32
EGFR P00533 2/20 0.31
ERBB2 P04626 2/20 0.31
APP P05067 1/20 0.30
ALDH1A1 P00352 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL434186 1.00 CNR2 (0.37) CNR2MEN1KMT2AHTTSMN1; SMN2
SCHEMBL438066 0.87 CNR2 (0.42) CNR2MEN1KMT2AL3MBTL1KDM4E
SCHEMBL438067 0.87 CNR2 (0.42) CNR2MEN1KMT2AL3MBTL1KDM4E
SCHEMBL436342 0.79 CNR2 (0.36) CNR2MEN1KMT2AHTTSMN1; SMN2
SCHEMBL436345 0.79 NPSR1 (0.45) CNR2MEN1KMT2AHTTSMN1; SMN2
SCHEMBL435293 0.78 SLC2A1 (0.42) MEN1KMT2AL3MBTL1MAPTMAPK1
SCHEMBL435292 0.78 SLC2A1 (0.42) MEN1KMT2AL3MBTL1MAPTMAPK1
SCHEMBL436344 0.77 CNR2 (0.39) CNR2MEN1KMT2AHTTSMN1; SMN2
SCHEMBL436219 0.77 CNR2 (0.34) CNR2MEN1KMT2AHTTSMN1; SMN2
SCHEMBL436222 0.77 ESRRG (0.37) CNR2MEN1KMT2AHTTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8101703-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polyimide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD (TW) 2012-01-24 US claimed
US-20100297455-A1 PRECURSOR SOLUTION FOR POLYIMIDE/SILICA COMPOSITE MATERIAL, ITS MANUFACTURE METHOD, AND POLYIMIDE/SILICA COMPOSITE MATERIAL HAVING LOW VOLUME SHRINKAGE ETERNAL CHEMICAL CO., LTD. 2010-11-25 US claimed
US-7790828-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. (CN) 2010-09-07 US claimed
US-20050245715-A1 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. 2005-11-03 US claimed
US-8101703-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polyimide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD (TW) 2012-01-24 US disclosed
US-20100297455-A1 PRECURSOR SOLUTION FOR POLYIMIDE/SILICA COMPOSITE MATERIAL, ITS MANUFACTURE METHOD, AND POLYIMIDE/SILICA COMPOSITE MATERIAL HAVING LOW VOLUME SHRINKAGE ETERNAL CHEMICAL CO., LTD. 2010-11-25 US disclosed
US-7790828-B2 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. (CN) 2010-09-07 US disclosed
US-20050245715-A1 Precursor solution for polyimide/silica composite material, its manufacture method, and polymide/silica composite material having low volume shrinkage ETERNAL CHEMICAL CO., LTD. 2005-11-03 US disclosed