Perchlorate

Perchlorate

SCHEMBL4344944

[Be+2].[O-][Cl+3]([O-])([O-])[O-].[O-][Cl+3]([O-])([O-])[O-]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Perchlorate SCHEMBL869954 0.80
Perchlorate SCHEMBL5015009 0.80
Perchlorate SCHEMBL159052 0.80
Perchlorate SCHEMBL1122987 0.80
Perchlorate SCHEMBL159287 0.80
Perchlorate SCHEMBL2682764 0.80
Perchlorate SCHEMBL11490710 0.80
Perchlorate SCHEMBL723927 0.80
Perchlorate SCHEMBL5022933 0.80
Perchlorate SCHEMBL135770 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3975223-A1 PROTECTIVE FLUID FOR ALUMINA MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-03-30 EP claimed
CN-112745659-A Thermoplastic polyurethane elastomer material containing antistatic master batch and preparation method thereof 昆山科信高分子材料有限公司 2021-05-04 CN claimed
US-20210002551-A1 PROTECTIVE FLUID FOR ALUMINA, PROTECTION METHOD, AND PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE HAVING ALUMINA LAYER USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-01-07 US claimed
EP-3761346-A1 PROTECTIVE FLUID FOR ALUMINA, PROTECTION METHOD, AND PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE HAVING ALUMINA LAYER USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-01-06 EP claimed
CN-111699547-A Protective solution and protective method for aluminum oxide, and method for manufacturing semiconductor substrate having aluminum oxide layer using same 三菱瓦斯化学株式会社 2020-09-22 CN claimed
EP-2948489-A1 A POLYESTER POLYURETHANE MATERIAL WITH LONG TERM HYDROLYSIS RESISTANCE Covestro Deutschland AG (DE) 2015-12-02 EP claimed
US-20150322196-A1 A POLYESTER POLYURETHANE MATERIAL WITH LONG TERM HYDROLYSIS RESISTANCE BAYER MATERIALSCIENCE AG (DE) 2015-11-12 US claimed
WO-2014114614-A1 A POLYESTER POLYURETHANE MATERIAL WITH LONG TERM HYDROLYSIS RESISTANCE BAYER MATERIALSCIENCE AG (DE) 2014-07-31 WO claimed
US-20250326694-A1 BLACK ZIRCONIA COMPOSITE SINTERED BODY AND METHOD FOR MANUFACTURING SAME KURARAY NORITAKE DENTAL INC. (JP) 2025-10-23 US disclosed
US-12338381-B2 Protective fluid for alumina, protection method, and production method for semiconductor substrate having alumina layer using same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-06-24 US disclosed
US-12319815-B2 Resin composition, method for producing same, and multi-liquid curable resin composition KANEKA CORPORATION (JP) 2025-06-03 US disclosed
US-12312494-B2 Resin composition, method for producing same, and multi-liquid curable resin composition KANEKA CORPORATION (JP) 2025-05-27 US disclosed
EP-4534504-A1 BLACK ZIRCONIA COMPOSITE SINTERED BODY AND METHOD FOR MANUFACTURING SAME Kuraray Noritake Dental Inc. (JP) 2025-04-09 EP disclosed
EP-4534505-A1 SINTERED ZIRCONIA COMPOSITE OBJECT AND PRODUCTION METHOD THEREFOR Kuraray Noritake Dental Inc. (JP) 2025-04-09 EP disclosed
US-20090197168-A1 STORAGE ELEMENT STELLA CHEMIFA CORPORATION (JP) 2009-08-06 US disclosed
EP-1950779-A1 ELECTRICAL STORAGE DEVICE Stella Chemifa Corporation (JP) 2008-07-30 EP disclosed
US-6472079-B2 PRODUCT OF HYDROLYSIS AND CONDENSATION OF AN ORGANOSILICON COMPOUND; 1A OR 2A COMPOUND, ESPECIALLY CARBOXYLIC SALT; SOLVENT; EXCELLENT CRACKING RESISTANCE AFTER A PCT (PRESSURE COOKER TEST). JSR CORPORATION (JP) 2002-10-29 US disclosed
US-20020045693-A1 Composition for film formation, method of film formation and silica-based film JSR CORPORATION (JP) 2002-04-18 US disclosed
EP-1148105-A2 Composition for film formation, method of film formation, and silica-based film JSR Corporation (JP) 2001-10-24 EP disclosed
US-5224663-A VEHICLE PROPULSION SYSTEM WITH EXTERNAL PROPELLANT SUPPLY CRISWELL DAVID R (US) 1993-07-06 US disclosed