SCHEMBL4351035

SCHEMBL4351035

Cl[Bi]Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3583648-B1 ELECTROLYTES FOR IRON FLOW BATTERY ESS TECHNOLOGY INC (US) 2024-06-12 EP claimed
WO-2019218594-A1 WATER-SOLUBLE PHOSPHORESCENT NANOPARTICLE FOR DETECTING HYPOCHLOROUS ACID USING RATIO METHOD AND PREPARATION METHOD AND APPLICATION THEREOF 南京邮电大学 (CN) 2019-11-21 WO claimed
CN-1214716-C Controlled-release composition ROHM & HAAS (US) 2005-08-17 CN claimed
CN-1200875-A Controlled-release composition ROHM & HAAS (US) 1998-12-09 CN claimed
US-20260108641-A1 PHYTIC ACID-BASED TERNARY COMPLEX BIOMIMETIC NANOMATERIAL, AND PREPARATION METHOD AND USE THEREOF THE SECOND HOSPITAL OF TIAN JIN MEDICAL UNIV (CN) 2026-04-23 US disclosed
US-20260104074-A1 BEARING ELEMENT AND METHOD OF MANUFACTURING A BEARING ELEMENT MAHLE ENGINE SYSTEMS UK LTD (GB) 2026-04-16 US disclosed
EP-4706690-A1 PHYTIC ACID-BASED TERNARY COMPLEX BIONIC NANO MATERIAL, AND PREPARATION METHOD AND USE THEREOF The Second Hospital of Tian Jin Medical University (CN) 2026-03-11 EP disclosed
CN-119874481-A Method for purifying photoacid generator for photoresist 湖北鼎龙芯盛科技有限公司 2025-04-25 CN disclosed
WO-2024240275-A1 PHYTIC ACID-BASED TERNARY COMPLEX BIONIC NANO MATERIAL, AND PREPARATION METHOD AND USE THEREOF 天津医科大学第二医院 2024-11-28 WO disclosed
CN-112680758-B Method for enhancing copper electroplating 罗门哈斯电子材料有限责任公司 2024-11-15 CN disclosed
EP-4453112-A1 SELF ADHESIVE FOULING RELEASE COATING COMPOSITION PPG Coatings Europe B.V. (NL) 2024-10-30 EP disclosed
EP-4453057-A1 FOULING CONTROL COATING COMPOSITION PPG Coatings Europe B.V. (NL) 2024-10-30 EP disclosed
US-5811565-A TREATING MIXTURE WITH LEWIS ACID HALIDE DOW CORNING TORAY SILICONE CO., LTD. (JP) 1998-09-22 US disclosed
US-4845015-A NON-IMAGE AREA STAIN PREVENTION KONISHIROKU PHOTO INDUSTRY CO,., LTD. (JP) 1989-07-04 US disclosed
US-4562144-A WATER SOLUBLE BISMUTH COMPOUND KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1985-12-31 US disclosed
EP-0058046-B1 PROCESS FOR PRODUCING METHACROLEIN AND METHACRYLIC ACID UBE INDUSTRIES, LTD. (JP) 1984-08-01 EP disclosed
EP-0058046-A1 Process for producing methacrolein and methacrylic acid UBE INDUSTRIES, LTD. (JP) 1982-08-18 EP disclosed
US-4267385-A OXIDATION OF PROPYLENE OR ISOBUTYLENE USING COMBINED OXIDES OF MOLYBDENUM, COBALT, MICKEL, BISMUTH, TITANIUM, IRON, ALUMINUM, AND AN ALKALI METAL UBE INDUSTRIES, LTD. (JP) 1981-05-12 US disclosed
US-4217309-A CATALYTIC OXIDATION OF ISOBUTYLENE UBE INDUSTRIES, LTD. (JP) 1980-08-12 US disclosed
US-4171328-A CATALYST CONTAINING CALCINED MOLYBDENUM, BISMUTH, IRON, COBALT, ZIRCONIUM, TITANIUM AND ZINC AND/OR CALCIUM OXIDES; FORMING METHACROLEIN UBE INDUSTRIES LTD. (JP) 1979-10-16 US disclosed